Electron and hole charge separation with a dual channel transistor

1989 ◽  
Vol 36 (11) ◽  
pp. 2604 ◽  
Author(s):  
A. Roy ◽  
M.H. White
2014 ◽  
Vol 16 (33) ◽  
pp. 17748-17755 ◽  
Author(s):  
P. Sudhagar ◽  
Anitha Devadoss ◽  
Taeseup Song ◽  
P. Lakshmipathiraj ◽  
Hyungkyu Han ◽  
...  

Maximizing the Au nanoparticle decoration on TiO2nanowire through nitrogen doping for simultaneous enhancement in visible light scattering and electron–hole charge separation.


2013 ◽  
Vol 118 (1) ◽  
pp. 126-134 ◽  
Author(s):  
Luis G. C. Rego ◽  
Bruno C. Hames ◽  
Kahio T. Mazon ◽  
Jan-Ole Joswig

1993 ◽  
Vol 54 (1-3) ◽  
pp. 385-390 ◽  
Author(s):  
A. Saxena ◽  
X.Z. Huang ◽  
A.R. Bishop ◽  
L.A. Worl ◽  
S.P. Love ◽  
...  

2019 ◽  
Vol 21 (4) ◽  
pp. 2102-2114
Author(s):  
Vytautas Grivickas ◽  
Patrik Ščajev ◽  
Vitalijus Bikbajevas ◽  
Olga V. Korolik ◽  
Alexander V. Mazanik

Imprinted transient grating fringes in TlInS2 are attributed to new crystal phase formed by 2D electron–hole charge separation on local layers.


2016 ◽  
Vol 186 (6) ◽  
pp. 597-625 ◽  
Author(s):  
Andrei G. Yakovlev ◽  
Vladimir A. Shuvalov
Keyword(s):  

2003 ◽  
Vol 765 ◽  
Author(s):  
Minjoo L. Lee ◽  
Eugene A. Fitzgerald

AbstractThe use of alternative channel materials such as germanium [1,2] and strained silicon (ε-Si) [3-5] is increasingly being considered as a method for improving the performance of MOSFETs. While ε-Si grown on relaxed Si1-x Gex is drawing closer to widespread commercialization, it is currently believed that almost all of the performance benefit in CMOS implementations will derive from the enhanced mobility of the n -MOSFET [5]. In this paper, we demonstrate that ε-Si p -MOSFETs can be engineered to exhibit mobility enhancements that increase or remain constant as a function of inversion density. We have also designed and fabricated ε-Si / ε-Ge dual-channel p -MOSFETs exhibiting mobility enhancements of 10 times. These p -MOSFETs can be integrated on the same wafers as ε-Si n -MOSFETs, making symmetric-mobility CMOS possible.


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