scholarly journals Cold-fluid theory of equilibrium and stability of a high-intensity periodically twisted ellipse-shaped charged-particle beam

2006 ◽  
Vol 9 (3) ◽  
Author(s):  
Jing Zhou ◽  
Ronak Bhatt ◽  
Chiping Chen
Keyword(s):  
Charged Particle ◽  
High Intensity ◽  
Particle Beam ◽  
Charged Particle Beam ◽  
Cold Fluid ◽  
Fluid Theory

scholarly journals Analytical method for determining at equilibrium the envelope and emittance of initially mismatched beams

2009 ◽  
Vol 75 (6) ◽  
pp. 829-839 ◽  
Author(s):  
R. P. NUNES ◽  
F. B. RIZZATO
Keyword(s):  
Charged Particle ◽  
Analytical Method ◽  
High Intensity ◽  
Particle Beam ◽  
Current Approach ◽  
Charged Particle Beam ◽  
Magnetic Focusing ◽  
Self Consistent ◽  
Analytic Expression ◽  
Beam Parameters

AbstractThis work presents a fully analytic way of determining relevant equilibrium quantities of a high-intensity charged particle beam submitted to magnetic focusing while inside a linear channel. Through the current approach, some intermediate steps of our original hybrid model which had to be solved numerically can now be eliminated, leading to the obtainment of a fully analytic expression. This expression relates the initial beam parameters with those at equilibrium, allowing beam macroscopic quantities such as envelope and emittance to be naturally and analytically determined. For validation, full self-consistent N-particle beam numerical simulations have been carried out and the results compared with the predictions supplied by the full analytical model. The agreement is shown to be good with the simulations and also with the original hybrid numerical-analytical version of the model.

scholarly journals Charged particle single nanometre manufacturing

2018 ◽  
Vol 9 ◽  
pp. 2855-2882 ◽  
Author(s):  
Philip D Prewett ◽  
Cornelis W Hagen ◽  
Claudia Lenk ◽  
Steve Lenk ◽  
Marcus Kaestner ◽  
...  
Keyword(s):  
Charged Particle ◽  
High Throughput ◽  
Nanoimprint Lithography ◽  
Ion Beam ◽  
Ambient Air ◽  
Particle Beam ◽  
Vacuum System ◽  
Scanning Tunneling ◽  
Tunneling Microscopy ◽  
Charged Particle Beam

Following a brief historical summary of the way in which electron beam lithography developed out of the scanning electron microscope, three state-of-the-art charged-particle beam nanopatterning technologies are considered. All three have been the subject of a recently completed European Union Project entitled “Single Nanometre Manufacturing: Beyond CMOS”. Scanning helium ion beam lithography has the advantages of virtually zero proximity effect, nanoscale patterning capability and high sensitivity in combination with a novel fullerene resist based on the sub-nanometre C60 molecule. The shot noise-limited minimum linewidth achieved to date is 6 nm. The second technology, focused electron induced processing (FEBIP), uses a nozzle-dispensed precursor gas either to etch or to deposit patterns on the nanometre scale without the need for resist. The process has potential for high throughput enhancement using multiple electron beams and a system employing up to 196 beams is under development based on a commercial SEM platform. Among its potential applications is the manufacture of templates for nanoimprint lithography, NIL. This is also a target application for the third and final charged particle technology, viz. field emission electron scanning probe lithography, FE-eSPL. This has been developed out of scanning tunneling microscopy using lower-energy electrons (tens of electronvolts rather than the tens of kiloelectronvolts of the other techniques). It has the considerable advantage of being employed without the need for a vacuum system, in ambient air and is capable of sub-10 nm patterning using either developable resists or a self-developing mode applicable for many polymeric resists, which is preferred. Like FEBIP it is potentially capable of massive parallelization for applications requiring high throughput.

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