Dynamic Scaling Behavior of Ballistic Coalescence

1995 ◽  
Vol 74 (21) ◽  
pp. 4114-4117 ◽  
Author(s):  
Emmanuel Trizac ◽  
Jean-Pierre Hansen
2003 ◽  
Vol 14 (07) ◽  
pp. 945-954 ◽  
Author(s):  
MEHMET DİLAVER ◽  
SEMRA GÜNDÜÇ ◽  
MERAL AYDIN ◽  
YİĞİT GÜNDÜÇ

In this work we have considered the Taylor series expansion of the dynamic scaling relation of the magnetization with respect to small initial magnetization values in order to study the dynamic scaling behavior of two- and three-dimensional Ising models. We have used the literature values of the critical exponents and of the new dynamic exponent x0 to observe the dynamic finite-size scaling behavior of the time evolution of the magnetization during early stages of the Monte Carlo simulation. For the three-dimensional Ising model we have also presented that this method opens the possibility of calculating z and x0 separately. Our results show good agreement with the literature values. Measurements done on lattices with different sizes seem to give very good scaling.


2001 ◽  
Vol 86 (8) ◽  
pp. 1570-1573 ◽  
Author(s):  
R. D. Narhe ◽  
M. D. Khandkar ◽  
K. P. Adhi ◽  
A. V. Limaye ◽  
S. R. Sainkar ◽  
...  

1992 ◽  
Vol 97 (12) ◽  
pp. 9291-9298 ◽  
Author(s):  
K. Kubota ◽  
N. Kuwahara ◽  
H. Eda ◽  
M. Sakazume ◽  
K. Takiwaki

2014 ◽  
Vol 104 (9) ◽  
pp. 092904 ◽  
Author(s):  
Kui Li ◽  
Nossikpendou Sama ◽  
Tao Li ◽  
Denis Rémiens ◽  
Gang Du ◽  
...  

1994 ◽  
Vol 367 ◽  
Author(s):  
Hiroshi Iwasaki ◽  
Atsushi Iwamoto ◽  
Koichi Sudoh ◽  
Tatsuo Yoshinobu

AbstractStatic and dynamic scaling behavior in copper electrochemical deposition in the stable growth condition (non-bulk fractal growth) was studied by atomic force microscopy and numerical simulation. We found two distinct scaling regimes with roughness exponent α of 0.6 and 0.87α0.05 corresponding to the concentrations of the “brightener” organic additive higher and lower than 1 mℓ/ℓ, respectively. The rms surface width of the whole measured area of the surfaces in the former regime was smaller than that in the latter regime. For the latter rougher surface, we observed dynamic scaling behavior for longer length scales as well as the stationary scaling behavior for shorter length scales: surface width did not further increase with linear size of the area for longer length scales than a characteristic correlation length and increased as a power of deposition time with the dynamic exponent β of 0.45. The sum of α + (α/β) was larger than the value expected for KPZ local growth, 2. This was understood that in electrochemical deposition there is enhancement of growth at protrusions owing to non-local Laplacian field effect. The smoother (α =0.6) and the rougher (0.87) surfaces were reproduced by numerical solutions of KPZ + (the growth term proportional to height) for the shorter and the longer growth times, respectively. Bifurcation of the surface morphology is understood as a result of decrease of weight of the additional term owing to increase of the additive.


2016 ◽  
Vol 52 (2) ◽  
pp. 1-5 ◽  
Author(s):  
Djati Handoko ◽  
Duy-Truong Quach ◽  
Sang-Hyuk Lee ◽  
Kyung Min Lee ◽  
Jong-Ryul Jeong ◽  
...  

1995 ◽  
Vol 52 (5) ◽  
pp. 5664-5666 ◽  
Author(s):  
Heungwon Park ◽  
Mann Ho Kim ◽  
Hyunggyu Park

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