Multiphoton Ionization of Rare Gases at Very High Laser Intensity (1015W/cm2) by a 30-psec Laser Pulse at 1.06 μm

1976 ◽  
Vol 36 (16) ◽  
pp. 949-952 ◽  
Author(s):  
L. A. Lompre ◽  
G. Mainfray ◽  
C. Manus ◽  
S. Repoux ◽  
J. Thebault
Keyword(s):  
Laser Pulse ◽  
Laser Intensity ◽  
Multiphoton Ionization ◽  
Rare Gases ◽  
High Laser ◽  
Very High ◽  
High Laser Intensity

Multiple Harmonic Generation in Rare Gases at High Laser Intensity

The Electron ◽  
1991 ◽  
pp. 321-332
Author(s):  
Anne L’huillier ◽  
Louis-André Lompre ◽  
Mainfray Gérard
Keyword(s):  
Harmonic Generation ◽  
Laser Intensity ◽  
Rare Gases ◽  
High Laser ◽  
High Laser Intensity

Multiple-harmonic generation in rare gases at high laser intensity

1989 ◽  
Vol 39 (11) ◽  
pp. 5751-5761 ◽  
Author(s):  
X. F. Li ◽  
A. L’Huillier ◽  
M. Ferray ◽  
L. A. Lompré ◽  
G. Mainfray
Keyword(s):  
Harmonic Generation ◽  
Laser Intensity ◽  
Rare Gases ◽  
High Laser ◽  
High Laser Intensity

Quantitative fs-TALIF in high-pressure NRP discharges: Calibration using VUV absorption spectroscopy

2021 ◽  
Author(s):  
Ciprian Dumitrache ◽  
Arnaud Gallant ◽  
Nelson de Oliveira ◽  
Christophe O Laux ◽  
Gabi Daniel Stancu
Keyword(s):  
Laser Intensity ◽  
Limit Of Detection ◽  
Diagnostic Technique ◽  
Low Pressure ◽  
Photon Absorption ◽  
Post Discharge ◽  
Pure Nitrogen ◽  
High Laser ◽  
High Laser Intensity ◽  
Intensity Regime

Abstract This work presents a femtosecond two-photon absorption laser-induced fluorescence (fs-TALIF) diagnostic for measuring ground-state atomic nitrogen in nanosecond repetitively pulsed (NRP) discharges. Absolute atom density is obtained from the TALIF signal via a novel calibration technique based on one-photon direct absorption measurements performed in a low-pressure DC discharge. The VUV measurements were done at the Soleil synchrotron facility using the high-resolution Fourier-transform spectrometer (minimum linewidth Δ̃ = 0.08 cm-1). The main goal of this work was to develop a quench-free diagnostic technique, which would allow measurements at elevated pressures with high spatial and temporal resolution. Here fs-TALIF measurements of N(4S) are demonstrated in the NRP post-discharge between 1-500 μs after the nanosecond high-voltage pulse. A maximum number density of N-atoms of × − was measured at 1 μs after the pulse when the discharge was operated at 1 bar in pure nitrogen. This corresponds to a dissociation fraction of ~ 0.1 %. The fs-TALIF technique at high laser intensity regime (> 1 TW cm-2) calibrated using VUV absorption was compared with the fs-TALIF at low laser intensity regime (< 100 MW cm-2) calibrated via the well-established non-saturated TALIF technique using krypton as an etalon gas. It was found that the two measurements of N(4S) in the NRP post-discharge agree within a factor of 3. Importantly, the limit of detection of the fs-TALIF at high laser intensity regime was determined to be ()~ e 1/. This is approximately one order of magnitude better than previously reported by ns-TALIF in low-pressure discharges.

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