scholarly journals Phonon linewidth due to electron-phonon interactions with strong forward scattering in FeSe thin films on oxide substrates

2017 ◽  
Vol 96 (5) ◽  
Author(s):  
Yan Wang ◽  
Louk Rademaker ◽  
Elbio Dagotto ◽  
Steven Johnston
Keyword(s):  
Thin Films ◽  
Forward Scattering ◽  
Oxide Substrates ◽  
Phonon Linewidth

Growth and Physical Properties of ZnTe0.1Se0.9 Thin Films Prepared on Indium Tin Oxide Substrates

2013 ◽  
Vol 63 (1) ◽  
pp. 73-79
Author(s):  
Do Hyung KIM ◽  
Soo Chang CHOI ◽  
Eun Jeong YOON ◽  
Chang Young PARK ◽  
Jong Duk LEE ◽  
...  
Keyword(s):  
Thin Films ◽  
Physical Properties ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Oxide Substrates

Ferromagnetic epitaxial Cr2O3 thin films grown on oxide substrates by Pulsed Laser Deposition

2020 ◽  
Vol 534 ◽  
pp. 147638
Author(s):  
María Vila ◽  
Juan Rubio-Zuazo ◽  
Irene Lucas ◽  
César Magén ◽  
Alicia Prados ◽  
...  
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Oxide Substrates

ELECTRO-OPTIC EFFECT IN FERROELECTRIC Na0.5K0.5NbO3 THIN FILMS ON OXIDE SUBSTRATES

2006 ◽  
Vol 80 (1) ◽  
pp. 97-106 ◽  
Author(s):  
MATS BLOMQVIST ◽  
SERGEY KHARTSEV ◽  
ALEX GRISHIN
Keyword(s):  
Thin Films ◽  
Electro Optic ◽  
Oxide Substrates

Interface effects in theNi2px-ray photoelectron spectra of NiO thin films grown on oxide substrates

2008 ◽  
Vol 77 (7) ◽  
Author(s):  
I. Preda ◽  
A. Gutiérrez ◽  
M. Abbate ◽  
F. Yubero ◽  
J. Méndez ◽  
...  
Keyword(s):  
Thin Films ◽  
Photoelectron Spectra ◽  
Oxide Substrates ◽  
Interface Effects

Epitaxial copper oxide thin films deposited on cubic oxide substrates

2008 ◽  
Vol 41 (12) ◽  
pp. 125407 ◽  
Author(s):  
I Pallecchi ◽  
E Bellingeri ◽  
C Bernini ◽  
L Pellegrino ◽  
A S Siri ◽  
...  
Keyword(s):  
Thin Films ◽  
Copper Oxide ◽  
Oxide Thin Films ◽  
Oxide Substrates

Lead Titanate Thin Films Prepared by Metallorganic Chemical Vapor Deposion (MOCVD) on Sapphire, Pt, and RuOx Substrates

1993 ◽  
Vol 335 ◽  
Author(s):  
Warren C. Hendricks ◽  
Seshu B. Desu ◽  
Chien H. Peng
Keyword(s):  
Thin Films ◽  
Ruthenium Oxide ◽  
Chemical Vapor ◽  
X Ray Diffraction ◽  
Experimental Conditions ◽  
X Ray ◽  
Composition Control ◽  
Oxide Substrates ◽  
Temperature Deposition ◽  
Titanium Ethoxide

AbstractTransparent and highly specular PbTiO3 thin films were deposited on sapphire, platinum and ruthenium oxide-coated silicon wafers by hot-wall metallorganic chemical vapor deposition (MOCVD). Lead bis-tetramethylheptadionate and titanium ethoxide were used as chemical precursors. Films were deposited over a range of experimental conditions. X-ray diffraction (XRD) was used to determine the phases present in the films; Scanning Electron Microscopy (SEM) was used to examine the surface morphology and Energy Dispersive Spectroscopy (EDS) was used to determine the composition. Optical spectra were obtained to confirm the highly dense and transparent nature of the films. The chemical stability of the ruthenium oxide substrates in the MOCVD environment as well as the existence of a high-temperature deposition regime for composition control are also discussed.

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