scholarly journals Magnetic anisotropy and valence states in La2Co1−xMn1+xO6 ( x≈0.23 ) thin films studied by x-ray absorption spectroscopy techniques

2017 ◽  
Vol 95 (22) ◽  
Author(s):  
Laura López-Mir ◽  
Regina Galceran ◽  
Javier Herrero-Martín ◽  
Bernat Bozzo ◽  
José Cisneros-Fernández ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetic Anisotropy ◽  
Absorption Spectroscopy ◽  
X Ray ◽  
Valence States ◽  
X Ray Absorption

Investigation of the valence states of Fe and Co in Fe1−xCoxOy(0

2008 ◽  
Vol 20 (25) ◽  
pp. 255236 ◽  
Author(s):  
C L Chen ◽  
C L Dong ◽  
S M Rao ◽  
G Chern ◽  
M C Chen ◽  
...  
Keyword(s):  
Thin Films ◽  
Absorption Spectroscopy ◽  
X Ray ◽  
Valence States ◽  
X Ray Absorption

scholarly journals X-ray absorption spectroscopy elucidates the impact of structural disorder on electron mobility in amorphous zinc-tin-oxide thin films

2014 ◽  
Vol 104 (24) ◽  
pp. 242113 ◽  
Author(s):  
Sin Cheng Siah ◽  
Sang Woon Lee ◽  
Yun Seog Lee ◽  
Jaeyeong Heo ◽  
Tomohiro Shibata ◽  
...  
Keyword(s):  
Thin Films ◽  
Absorption Spectroscopy ◽  
Tin Oxide ◽  
Electron Mobility ◽  
Structural Disorder ◽  
Oxide Thin Films ◽  
X Ray ◽  
Zinc Tin Oxide ◽  
The Impact ◽  
X Ray Absorption

X-ray Absorption Spectroscopy Study of TiO2–x Thin Films for Memory Applications

2015 ◽  
Vol 119 (8) ◽  
pp. 4362-4370 ◽  
Author(s):  
D. Carta ◽  
G. Mountjoy ◽  
A. Regoutz ◽  
A. Khiat ◽  
A. Serb ◽  
...  
Keyword(s):  
Thin Films ◽  
Absorption Spectroscopy ◽  
Spectroscopy Study ◽  
X Ray ◽  
Memory Applications ◽  
X Ray Absorption

A practical method for determining film thickness using X-ray absorption spectroscopy in total electron yield mode

2021 ◽  
Vol 28 (6) ◽  
Author(s):  
Noritake Isomura ◽  
Keiichiro Oh-ishi ◽  
Naoko Takahashi ◽  
Satoru Kosaka
Keyword(s):  
Thin Films ◽  
Film Thickness ◽  
Absorption Spectroscopy ◽  
Electron Spectroscopy ◽  
Practical Method ◽  
Decay Length ◽  
Total Electron ◽  
X Ray ◽  
Logarithmic Equation ◽  
X Ray Absorption

Thin films formed on surfaces have a large impact on the properties of materials and devices. In this study, a method is proposed using X-ray absorption spectroscopy to derive the film thickness of a thin film formed on a substrate using the spectral separation and logarithmic equation, which is a modified version of the formula used in electron spectroscopy. In the equation, the decay length in X-ray absorption spectroscopy is longer than in electron spectroscopy due to a cascade of inelastic scattering of electrons generated in a solid. The modification factor, representing a multiple of the decay length, was experimentally determined using oxidized Si and Cu with films of thickness 19 nm and 39 nm, respectively. The validity of the proposed method was verified, and the results indicated that the method can be used in the analysis of various materials with thin films.

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