Electronic structure and mechanical properties of ternary ZrTaN alloys studied byab initiocalculations and thin-film growth experiments

2014 ◽  
Vol 90 (14) ◽  
Author(s):  
G. Abadias ◽  
M. B. Kanoun ◽  
S. Goumri-Said ◽  
L. Koutsokeras ◽  
S. N. Dub ◽  
...  
Keyword(s):  
Thin Film ◽  
Mechanical Properties ◽  
Electronic Structure ◽  
Film Growth ◽  
Thin Film Growth ◽  
Growth Experiments

Mechanical Properties in Small Dimensions

MRS Bulletin ◽  
2002 ◽  
Vol 27 (1) ◽  
pp. 12-17 ◽  
Author(s):  
Richard P. Vinci ◽  
Shefford P. Baker
Keyword(s):  
Thin Film ◽  
Mechanical Properties ◽  
Mechanical Behavior ◽  
Significant Role ◽  
Creep Deformation ◽  
Film Growth ◽  
Thin Film Growth ◽  
Length Scale ◽  
Deformation And Fracture ◽  
Anelastic Behavior

AbstractThis brief article describes the content of the January 2002 issue of MRS Bulletin focusing on Mechanical Properties in Small Dimensions. Articles discuss the current understanding ofstressevolution during thin-film growth, elastic and anelastic behavior, dislocation-mediated plasticity, creep deformation, and fracture. Emphasis is placed on explaining the mechanisms that underlie thewell-known fact that length scale can play a significant role in mechanical behavior.

Ion Thinning of Electron Transparent Single Crystal Sapphire Substrates

1974 ◽  
Vol 32 ◽  
pp. 468-469
Author(s):  
J. L. Kenty ◽  
R. E. Johnson
Keyword(s):  
Thin Film ◽  
Single Crystal ◽  
Film Growth ◽  
Ion Beam ◽  
Thin Film Growth ◽  
Sapphire Substrates ◽  
Single Crystal Sapphire ◽  
Growth Experiments

Samples of single crystal sapphire (α-Al2O3) have been ion-beam thinned to yield electron transparent regions suitable for use as substrates for in situ thin film growth experiments. Routine fabrication of 1 mm dia. samples containing one or more thin (∼200Å) regions ∼10μm2 in area was possible. The samples were surprisingly robust, many surviving post-thinning subdivision, mounting into a TEM environment cell, and heating to ∼1200°C.

Effect of polyatomic ion structure on thin-film growth: Experiments and molecular dynamics simulations

2000 ◽  
Vol 88 (9) ◽  
pp. 5004-5016 ◽  
Author(s):  
Muthu B. J. Wijesundara ◽  
Yuan Ji ◽  
Boris Ni ◽  
Susan B. Sinnott ◽  
Luke Hanley
Keyword(s):  
Thin Film ◽  
Molecular Dynamics ◽  
Molecular Dynamics Simulations ◽  
Film Growth ◽  
Thin Film Growth ◽  
Ion Structure ◽  
Dynamics Simulations ◽  
Growth Experiments

Thickness and Substrate Dependent Thin Film Growth of Picene and Impact on the Electronic Structure

2015 ◽  
Vol 119 (52) ◽  
pp. 29027-29037 ◽  
Author(s):  
Takuya Hosokai ◽  
Alexander Hinderhofer ◽  
Fabio Bussolotti ◽  
Keiichirou Yonezawa ◽  
Christopher Lorch ◽  
...  
Keyword(s):  
Thin Film ◽  
Electronic Structure ◽  
Film Growth ◽  
Thin Film Growth

scholarly journals Thin film growth of heavy fermion chiral magnet YbNi3Al9

2021 ◽  
Vol 118 (10) ◽  
pp. 102402
Author(s):  
Hiroaki Shishido ◽  
Akira Okumura ◽  
Tatsuya Saimyoji ◽  
Shota Nakamura ◽  
Shigeo Ohara ◽  
...  
Keyword(s):  
Thin Film ◽  
Heavy Fermion ◽  
Film Growth ◽  
Thin Film Growth

Radical-triggered cross-linking for molecular layer deposition of SiAlCOH hybrid thin films

2021 ◽  
Author(s):  
Kristina Ashurbekova ◽  
Karina Ashurbekova ◽  
Iva Saric ◽  
Evgeny Modin ◽  
Mladen Petravic ◽  
...  
Keyword(s):  
Thin Film ◽  
Film Growth ◽  
Molecular Layer ◽  
Thin Film Growth ◽  
Cross Linking ◽  
Layer By Layer ◽  
Molecular Layer Deposition ◽  
Layer Deposition ◽  
Hybrid Thin Films ◽  
Enhanced Stability

We developed a thin film growth with a radical-initiated cross-linking of vinyl groups in a layer-by-layer manner via molecular layer deposition (MLD). The cross-linked film exhibited improved properties like 12% higher density and enhanced stability compared to the non-cross-linked film.

Atomic Layer Deposition of Chalcogenides for Next-Generation Phase Change Memory

2021 ◽  
Author(s):  
Yoon Kyeung Lee ◽  
Chanyoung Yoo ◽  
Woohyun Kim ◽  
Jeongwoo Jeon ◽  
Cheol Seong Hwang
Keyword(s):  
Thin Film ◽  
Atomic Layer Deposition ◽  
Film Growth ◽  
Phase Change Memory ◽  
Film Surface ◽  
Atomic Layer ◽  
Thin Film Growth ◽  
Growth Technique ◽  
Layer Deposition ◽  
Change Memory

Atomic layer deposition (ALD) is a thin film growth technique that uses self-limiting, sequential reactions localized at the growing film surface. It guarantees exceptional conformality on high-aspect-ratio structures and controllability...

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