scholarly journals Properties of the electron-doped infinite-layer superconductor Sr1−xLaxCuO2epitaxially grown by pulsed laser deposition

2012 ◽  
Vol 85 (2) ◽  
Author(s):  
J. Tomaschko ◽  
V. Leca ◽  
T. Selistrovski ◽  
S. Diebold ◽  
J. Jochum ◽  
...  
Keyword(s):  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Infinite Layer

scholarly journals Formation of artificially-Layered Thin-Film Compounds Using Pulsed-Laser Deposition

1995 ◽  
Vol 388 ◽  
Author(s):  
David P. Norton ◽  
B. C. Chakoumakos ◽  
D. H. Lowndes ◽  
J. D. Budai
Keyword(s):  
Thin Film ◽  
Pulsed Laser Deposition ◽  
Layer Structure ◽  
Finite Thickness ◽  
Pulsed Laser ◽  
Unit Cell ◽  
Laser Deposition ◽  
Thickness Variation ◽  
Infinite Layer ◽  
Layered Thin Film

AbstractSuperlattice structures, consisting of SrCuO2, (Sr,Ca)CuO2, and BaCuO2 layers in the tetragonal, "infinite layer" crystal structure, have been grown by pulsed-laser deposition (PLD). Superlattice chemical modulation is observed for structures with component layers as thin as a single unit cell (~3.4 Å), indicating that unit-cell control of (Sr,Ca)CuO2 growth is possible using conventional pulsed-laser deposition over a wide oxygen pressure regime. X-ray diffraction intensity oscillations, due to the finite thickness of the film, indicate that these films are extremely flat with a thickness variation of only ~20 Å over a length scale of several thousand angstroms. Using the constraint of epitaxy to grow metastable cuprates in the infinite layer structure, novel high-temperature superconducting structural families have been formed. IN particular, epitaxially-stabilized SrCuO2/BaCuO2 superlattices, grown by sequentially depositing on lattice-matched (100) SrTiO3 from BaCuO2 and SrCuO2 ablation targets in a PLD system, show metallic conductivity and superconductivity at Tc(onset) ~70 K. these results show that pulsed-laser deposition and epitaxial stabilization have been used to effectively "engineer" artificially-layered thin-film materials.

Structural analysis of infinite layer superlattices grown by pulsed laser deposition

1996 ◽  
Vol 80 (2) ◽  
pp. 781-786 ◽  
Author(s):  
A. Del Vecchio ◽  
L. Tapfer ◽  
C. Aruta ◽  
G. Balestrino ◽  
G. Petrocelli
Keyword(s):  
Structural Analysis ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Infinite Layer

Pulsed-Laser Deposition and Characterization of Sr1−xNdxCuOy of “Infinite-Layer” Structure

1993 ◽  
pp. 207-210
Author(s):  
Nobuyuki Sugii ◽  
Koichi Kubo ◽  
Kiyoshi Yamamoto ◽  
Michiharu Ichikawa ◽  
H. Yamauchi
Keyword(s):  
Pulsed Laser Deposition ◽  
Layer Structure ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Infinite Layer

Growth of Sr1−xNdxCuOy Thin Films by Rf-Magnetron Sputtering and Pulsed-Laser Deposition

1992 ◽  
Vol 275 ◽  
Author(s):  
Nobuyuki Sugii ◽  
Michiharu Ichikawa ◽  
Koichi Kubo ◽  
Takeshi Sakurai ◽  
Kiyoshi Yamamoto ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Pulsed Laser Deposition ◽  
Layer Structure ◽  
Pulsed Laser ◽  
Rf Magnetron Sputtering ◽  
Lattice Parameter ◽  
Laser Deposition ◽  
Infinite Layer ◽  
Sputter Deposited

ABSTRACTSr1−xNdxCuOy thin films are grown on SrTiO3 substrates by rf-magnetron sputtering and pulsed-laser deposition. The sputter-deposited film with x=0 has an “infinite-layer” structure whose lattice constants are: α=0.390 nm and c=0.347 nm. When x is larger than 0.1, the films contain a phase of the Sr14CuO24O41 structure. The laser-deposited films of Sr1−xNdxCuOy with x≤.075 were single phase of the “infinite-layer” structure. The lattice parameter c decreased and the lattice parameter αincreased, as the Nd content, x, increased. The films with α=0.10 and 0.125 exhibited superconducting onset temperatures around 26 K. Weak Meissner signals were observed for these films at temperatures below 30 K.

Growth and characterization of infinite-layer films deposited by pulsed-laser deposition

1994 ◽  
Vol 16 (12) ◽  
pp. 1993-1998 ◽  
Author(s):  
G. Balestrino ◽  
E. Chiarati ◽  
S. Martellucci ◽  
A. Paoletti ◽  
G. Petrocelli ◽  
...  
Keyword(s):  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Infinite Layer

Superconducting Thin Films of “Infinite-Layer” Sr1-xNdxCuOySynthesized by Pulsed-Laser Deposition

1992 ◽  
Vol 31 (Part 2, No. 8A) ◽  
pp. L1024-L1026 ◽  
Author(s):  
Nobuyuki Sugii ◽  
Koichi Kubo ◽  
Michiharu Ichikawa ◽  
Kiyoshi Yamamoto ◽  
H. Yamauchi ◽  
...  
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Superconducting Thin Films ◽  
Infinite Layer

Microanalysis of silicate glass films grown on α-Al2O3 by pulsed-laser deposition

1993 ◽  
Vol 51 ◽  
pp. 438-439
Author(s):  
Michael P. Mallamaci ◽  
James Bentley ◽  
C. Barry Carter
Keyword(s):  
Liquid Phase ◽  
Single Crystal ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Ceramic Materials ◽  
Laser Deposition ◽  
Triple Junctions ◽  
Ion Milling ◽  
Multicomponent Oxides ◽  
Glass Films

Glass-oxide interfaces play important roles in developing the properties of liquid-phase sintered ceramics and glass-ceramic materials. Deposition of glasses in thin-film form on oxide substrates is a potential way to determine the properties of such interfaces directly. Pulsed-laser deposition (PLD) has been successful in growing stoichiometric thin films of multicomponent oxides. Since traditional glasses are multicomponent oxides, there is the potential for PLD to provide a unique method for growing amorphous coatings on ceramics with precise control of the glass composition. Deposition of an anorthite-based (CaAl2Si2O8) glass on single-crystal α-Al2O3 was chosen as a model system to explore the feasibility of PLD for growing glass layers, since anorthite-based glass films are commonly found in the grain boundaries and triple junctions of liquid-phase sintered α-Al2O3 ceramics.Single-crystal (0001) α-Al2O3 substrates in pre-thinned form were used for film depositions. Prethinned substrates were prepared by polishing the side intended for deposition, then dimpling and polishing the opposite side, and finally ion-milling to perforation.

Pulsed laser deposition of relaxor ferroelectric films

1998 ◽  
Vol 08 (PR9) ◽  
pp. Pr9-261-Pr9-264
Author(s):  
M. Tyunina ◽  
J. Levoska ◽  
A. Sternberg ◽  
V. Zauls ◽  
M. Kundzinsh ◽  
...  
Keyword(s):  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Relaxor Ferroelectric ◽  
Laser Deposition ◽  
Ferroelectric Films
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