Effects of fictive temperature and halogen doping on the boson peak in silica glass

2005 ◽  
Vol 71 (2) ◽  
Author(s):  
N. Shimodaira ◽  
K. Saito ◽  
N. Hiramitsu ◽  
S. Matsushita ◽  
A. J. Ikushima
Keyword(s):  
Silica Glass ◽  
Boson Peak ◽  
Fictive Temperature ◽  
Halogen Doping

scholarly journals Terahertz and Microwave Optical Properties of Single-Crystal Quartz and Vitreous Silica and the Behavior of the Boson Peak

2021 ◽  
Vol 11 (15) ◽  
pp. 6733
Author(s):  
Mira Naftaly ◽  
Andrew Gregory
Keyword(s):  
Single Crystal ◽  
Silica Glass ◽  
Broad Band ◽  
Peak Frequency ◽  
Vitreous Silica ◽  
Peak Height ◽  
Fused Silica ◽  
Boson Peak ◽  
Single Crystal Quartz ◽  
Crystal Quartz

Z-cut single-crystal quartz and vitreous silica (silica glass or fused silica) were evaluated for use as reference materials for terahertz and microwave measurements of complex permittivity, with Z-cut quartz confirmed as being suitable. Measurements of refractive indices and absorption coefficients for o-ray and e-ray in quartz and for vitreous silica are reported at frequencies between 0.2 and 6 THz and at 36 and 144 GHz, and compared with data reported in the literature. A previously unreported broad band was seen in the extraordinary absorption of quartz. The Boson peak in silica glass absorption was examined, and for the first time, two negative relationships have been observed: between the refractive index and the Boson peak frequency, and between the Boson peak height and its frequency.

Radiation hardening of silica glass through fictive temperature reduction

2017 ◽  
Vol 8 (3) ◽  
pp. 285-290 ◽  
Author(s):  
Matthieu Lancry ◽  
B. Hari Babu ◽  
Nadège Ollier ◽  
Bertrand Poumellec
Keyword(s):  
Silica Glass ◽  
Radiation Hardening ◽  
Fictive Temperature ◽  
Temperature Reduction

Fictive temperature of fracture surface of a silica glass

2010 ◽  
Vol 356 (23-24) ◽  
pp. 1194-1197 ◽  
Author(s):  
M. Tomozawa ◽  
C.-Y. Li ◽  
T.M. Gross
Keyword(s):  
Fracture Surface ◽  
Silica Glass ◽  
Fictive Temperature

scholarly journals Lattice dynamics ofα-cristobalite and the Boson peak in silica glass

2015 ◽  
Vol 27 (30) ◽  
pp. 305401 ◽  
Author(s):  
Björn Wehinger ◽  
Alexeï Bosak ◽  
Keith Refson ◽  
Alessandro Mirone ◽  
Aleksandr Chumakov ◽  
...  
Keyword(s):  
Silica Glass ◽  
Lattice Dynamics ◽  
Boson Peak

Influence of Ionizing Gas Flow on Structural Homogeneity of Type IV Silica Glass

2017 ◽  
Vol 726 ◽  
pp. 409-413 ◽  
Author(s):  
Yuan Cheng Sun ◽  
Xue Fu Song ◽  
Xiu Rong Du ◽  
Xiao Qiang Zhang ◽  
Hui Wang ◽  
...  
Keyword(s):  
Temperature Field ◽  
Silica Glass ◽  
Gas Flow ◽  
Uniform Temperature ◽  
Fictive Temperature ◽  
Structural Homogeneity ◽  
Type Iv ◽  
Structural Network ◽  
Uniform Temperature Field ◽  
Ionizing Gas

Type IV silica glass is the key material in inertial navigation and optical field due to its high purity and unbroken structural network. Structural homogeneity of type IV silica glass, which is mainly affected by producing process, is one of the most important properties and determines its usability. The influence of ionizing gas flow of plasma was studied in this paper. Flow rate of working gas and protecting gas was changed and the depositing temperature field was measured. Structural homogeneity of deposited silica glass was discussed by optical homogeneity, fictive temperature and stress birefringence. Results show that more uniform temperature field can be obtained with higher working gas flow and lower protecting gas flow, and the structural homogeneity of type IV silica glass is better. But the proportion of working gas and protecting gas should not be larger than 2. When the working gas and protecting gas are 5 m3/h and 2.5 m3/h respectively, the structural homogeneity of type IV silica glass is the best.

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