Proximity Effect in the Thin-Superconductor Limit

1973 ◽  
Vol 7 (1) ◽  
pp. 150-156 ◽  
Author(s):  
R. J. Todd ◽  
J. T. Chen ◽  
Y. W. Kim
Keyword(s):  
Proximity Effect ◽  
Thin Superconductor

Real-time observation of vortex lattices in a superconductor

1993 ◽  
Vol 51 ◽  
pp. 1050-1051
Author(s):  
K. Harada ◽  
T. Matsuda ◽  
J.E. Bonevich ◽  
M. Igarashi ◽  
S. Kondo ◽  
...  
Keyword(s):  
Real Time ◽  
Flux Line ◽  
Electron Holography ◽  
Lorentz Microscopy ◽  
Vortex Lattices ◽  
Flux Lines ◽  
Magnetic Flux Lines ◽  
Time Observation ◽  
Thin Superconductor ◽  
Real Time Observation

Previous observations of magnetic flux-lines (vortex lattices) in superconductors, such as the field distribution of a flux-line, and flux-line dynamics activated by heat and current, have employed the high spatial resolution and magnetic sensitivity of electron holography. And recently, the 2-D static distribution of vortices was also observed by this technique. However, real-time observations of the vortex lattice, in spite of scientific and technological interest, have not been possible due to experimental difficulties. Here, we report the real-time observation of vortex lattices in a thin superconductor, by means of Lorentz microscopy using a 300 kV field emission electron microscope. This technique allows us to observe the dynamic motion of individual vortices and record the events on a VTR system.The experimental arrangement is shown in Fig. 1. A Nb thin film for transmission observation was prepared by chemical etching. The grain size of the film was increased by annealing, and single crystals were observed with a thickness of 50∼90 nm.

Reversing the Proximity Effect in Civil Trials

2013 ◽  
Author(s):  
Kimberly Schweitzer ◽  
Scott Freng ◽  
Sean McCrea
Keyword(s):  
Proximity Effect ◽  
Civil Trials

Wave Propagation Characteristics on a Pipe-Type Cable in Particular Reference to the Proximity Effect

2013 ◽  
Vol 133 (12) ◽  
pp. 954-960 ◽  
Author(s):  
Akihiro Ametani ◽  
Kazuki Kawamura ◽  
Asha Shendge ◽  
Naoto Nagaoka ◽  
Yoshihiro Baba
Keyword(s):  
Wave Propagation ◽  
Proximity Effect ◽  
Propagation Characteristics

Fabrication of Si photonic waveguides by electron beam lithography using improved proximity effect correction

2020 ◽  
Vol 59 (12) ◽  
pp. 126502
Author(s):  
Moataz Eissa ◽  
Takuya Mitarai ◽  
Tomohiro Amemiya ◽  
Yasuyuki Miyamoto ◽  
Nobuhiko Nishiyama
Keyword(s):  
Electron Beam ◽  
Proximity Effect ◽  
Electron Beam Lithography ◽  
Photonic Waveguides ◽  
Proximity Effect Correction

Proximity and conformation effects in 29Si and 13C NMR spectra of di-ortho substituted trimethylsiloxybenzenes

1990 ◽  
Vol 55 (8) ◽  
pp. 2027-2032 ◽  
Author(s):  
Jan Schraml ◽  
Robert Brežný ◽  
Jan Čermák
Keyword(s):  
Benzene Ring ◽  
13C Nmr ◽  
Proximity Effect ◽  
Nmr Spectra ◽  
Methoxy Group ◽  
Chemical Shifts ◽  
Proximity Effects ◽  
13C Nmr Spectra ◽  
Methoxy Groups ◽  
C Nmr

29Si and 13C NMR spectra of five 4-substituted 2,6-dimethoxytrimethylsiloxybenzenes were studied with the aim to elucidate the nature of the deshielding proximity effects observed in the spectra of ortho substituted trimethylsiloxybenzenes. The sensitivity of 29Si chemical shifts to para substitution is in the studied compounds essentially the same as in mono ortho methoxytrimethylsiloxybenzenes. The deshielding proximity effect of the ìsecondî methoxy group is somewhat smaller than that of the ìfirstî group. The present results indicate that the two methoxy groups assume coplanar conformations with the benzene ring and are turned away from the trimethylsiloxy group which is not in the benzene plane. It is argued that in mono ortho methoxytrimethylsiloxybenzenes the two substituent groups adopt the same conformations as in the compounds studied here.

scholarly journals Analysis of Proximity Consequences of Coil Windings in Electromagnetic Forming

2021 ◽  
Vol 5 (2) ◽  
pp. 45
Author(s):  
Siddhant Prakash Goyal ◽  
Mohammadjavad Lashkari ◽  
Awab Elsayed ◽  
Marlon Hahn ◽  
A. Erman Tekkaya
Keyword(s):  
Proximity Effect ◽  
Experimental Methods ◽  
Electromagnetic Forming ◽  
Velocity Measurements ◽  
Local Curvature ◽  
Metal Parts ◽  
Sheet Metal Parts ◽  
Geometrical Features ◽  
Physical Phenomena ◽  
Inverse Distance

Multiturn coils are required for manufacturing sheet metal parts with varying depths and special geometrical features using electromagnetic forming (EMF). Due to close coil turns, the physical phenomena of the proximity effect and Lorentz forces between the parallel coil windings are observed. This work attempts to investigate the mechanical consequences of these phenomena using numerical and experimental methods. A numerical model was developed in LS-DYNA. It was validated using experimental post-mortem strain and laser-based velocity measurements after and during the experiments, respectively. It was observed that the proximity effect in the parallel conductors led to current density localization at the closest or furthest ends of the conductor cross-section and high local curvature of the formed sheet. Further analysis of the forces between two coil windings explained the departure from the “inverse-distance” rule observed in the literature. Finally, some measures to prevent or reduce undesired coil deformation are provided.

scholarly journals Magnetic proximity effect in Pt/CoFe2O4 bilayers

2018 ◽  
Vol 2 (1) ◽  
Author(s):  
Walid Amamou ◽  
Igor V. Pinchuk ◽  
Amanda H. Trout ◽  
Robert E. A. Williams ◽  
Nikolas Antolin ◽  
...  
Keyword(s):  
Proximity Effect ◽  
Magnetic Proximity Effect

scholarly journals Proximity Effect Aware Detailed Placement in Electron Beam Lithography

2018 ◽  
Vol 232 ◽  
pp. 04046
Author(s):  
Yuhang Chen ◽  
Zhipeng Huang ◽  
Xiongfeng Chen ◽  
Jianli Chen ◽  
Wenxing Zhu
Keyword(s):  
Electron Beam ◽  
Objective Function ◽  
Proximity Effect ◽  
Electron Beam Lithography ◽  
State Of The Art ◽  
Experimental Result ◽  
Accurate Evaluation ◽  
Evaluation Scheme ◽  
Gauss Transform ◽  
Detailed Placement

Proximity effect is one of the most tremendous consequences that produces unacceptable exposures during electron beam lithography (EBL), and thus distorting the layout pattern. In this paper, we propose the first work which considers the proximity effect during layout stage. We first give an accurate evaluation scheme to estimate the proximity effect by fast Gauss transform. Then, we devote a proximity effect aware detailed placement objective function to simultaneously consider wirelength, density and proximity effect. Furthermore, cell swapping and cell matching based methods are used to optimize the objective function such that there is no overlap among cells. Compared with a state-of-the-art work, experimental result shows that our algorithm can efficiently reduce the proximity variations and maintain high wirelength quality at a reasonable runtime.

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