Basic mechanisms of atomic displacement production in cubic silicon carbide: A molecular dynamics study

2002 ◽  
Vol 65 (4) ◽  
Author(s):  
L. Malerba ◽  
J. M. Perlado
1980 ◽  
Vol 41 (2) ◽  
pp. 201-207 ◽  
Author(s):  
I. A. Hønstvet ◽  
R. E. Smallman ◽  
P. M. Marquis

2005 ◽  
Vol 108-109 ◽  
pp. 671-676
Author(s):  
Guillaume Lucas ◽  
Laurent Pizzagalli

Using first principles molecular dynamics simulations, we have recently determined the threshold displacement energies and the associated created defects in cubic silicon carbide. Contrary to previous studies using classical molecular dynamics, we found values close to the experimental consensus, and also created defects in good agreement with recent works on interstitials stability in silicon carbide. We have also investigated the stability of several Frenkel pairs, using transition state theory and constrained path calculations.


2007 ◽  
Vol 131-133 ◽  
pp. 247-252
Author(s):  
Laurent Pizzagalli ◽  
Guillaume Lucas

Using first principles molecular dynamics and Nudged Elastic Band calculations, we have investigated the effect of irradiation on cubic silicon carbide at the atomic scale, and in particular the formation of Frenkel pairs, and the crystal recovery after thermal treatment. Threshold displacement energies have been determined for C and Si sublattice, and the stability and structure of the formed Frenkel pairs are described. The activation energies for annealing these defects have then been computed and compared with experiments.


2005 ◽  
Vol 98 (10) ◽  
pp. 103524 ◽  
Author(s):  
Hideaki Kikuchi ◽  
Rajiv K. Kalia ◽  
Aiichiro Nakano ◽  
Priya Vashishta ◽  
Paulo S. Branicio ◽  
...  

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