Dynamic scaling of the submonolayer island size distribution during self-assembled monolayer growth

1999 ◽  
Vol 60 (1) ◽  
pp. 14-17 ◽  
Author(s):  
Ivo Doudevski ◽  
Daniel K. Schwartz
Keyword(s):  
Size Distribution ◽  
Dynamic Scaling ◽  
Self Assembled Monolayer ◽  
Island Size ◽  
Monolayer Growth ◽  
Self Assembled

Influence of H2 Preconditioning on the Nucleation and Growth of Self-Assembled Germanium Islands on Silicon (001)

2004 ◽  
Vol 820 ◽  
Author(s):  
Gabriela D.M. Dilliway ◽  
Nicholas E.B. Cowern ◽  
Lu Xu ◽  
Patrick J. McNally ◽  
Chris Jeynes ◽  
...  
Keyword(s):  
Size Distribution ◽  
Self Assembly ◽  
Surface Coverage ◽  
Rutherford Backscattering Spectrometry ◽  
Chemical Vapour ◽  
Growth Conditions ◽  
Island Size ◽  
Practical Applications ◽  
Compositional Evolution ◽  
Self Assembled

AbstractUnderstanding the effects of growth conditions on the process of self-organisation of Ge nanostructures on Si is a key requirement for their practical applications. In this study we investigate the effect of preconditioning with a high-temperature hydrogenation step on the nucleation and subsequent temporal evolution of Ge self-assembled islands on Si (001). Two sets of structures, with and without H2 preconditioning, were grown by low pressure chemical vapour deposition (LPCVD) at 650°C. Their structural and compositional evolution was characterised by Rutherford backscattering spectrometry (RBS), atomic force microscopy (AFM) and micro-Raman (νRaman) spectroscopy. In the absence of preconditioning, we observe the known evolution of self-assembled Ge nanostructures on Si (001), from small islands with a narrow size distribution, to a bimodal size distribution, through to large islands. Surface coverage and island size increase steadily as a function of deposition time. On the H2 preconditioned surface, however, both nucleation rates and surface coverage are greatly increased during the early stages of self-assembly. After the first five seconds, the density of the islands is twice that on the unconditioned surface, and the mean island size is also larger, but the subsequent evolution is much slower than in the case of the unconditioned surface. This retardation correlates with a relatively high measured stress within the islands. Our results demonstrate that standard processes used during growth, like H2 preconditioning, can yield dramatic changes in the uniformity and distribution of Ge nanostructures self-assembled on Si.

Self-assembled monolayer growth on chemically modified polymer surfaces

2006 ◽  
Vol 252 (10) ◽  
pp. 3532-3540 ◽  
Author(s):  
S. Pimanpang ◽  
Pei-I. Wang ◽  
G.-C. Wang ◽  
T.-M. Lu
Keyword(s):  
Polymer Surfaces ◽  
Self Assembled Monolayer ◽  
Chemically Modified ◽  
Modified Polymer ◽  
Monolayer Growth ◽  
Self Assembled

Dynamic scaling of island-size distribution in submonolayer growth of 1×1 films

1994 ◽  
Vol 50 (15) ◽  
pp. 11116-11120 ◽  
Author(s):  
Q. Jiang ◽  
A. Chan ◽  
G.-C. Wang
Keyword(s):  
Size Distribution ◽  
Dynamic Scaling ◽  
Island Size

Supercritical Self-Assembled Monolayer Growth

2004 ◽  
Vol 126 (30) ◽  
pp. 9369-9373 ◽  
Author(s):  
James M. Mellott ◽  
Daniel K. Schwartz
Keyword(s):  
Self Assembled Monolayer ◽  
Monolayer Growth ◽  
Self Assembled

Kinetics of Self-Assembled Monolayer Growth Explored via Submonolayer Coverage of Incomplete Films

1997 ◽  
Vol 101 (38) ◽  
pp. 7535-7541 ◽  
Author(s):  
J. T. Woodward ◽  
I. Doudevski ◽  
H. D. Sikes ◽  
D. K. Schwartz
Keyword(s):  
Self Assembled Monolayer ◽  
Monolayer Growth ◽  
Self Assembled ◽  
Kinetics Of
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