Structural relaxation and magnetic anisotropy in Co/Cu(001) films

1996 ◽  
Vol 54 (6) ◽  
pp. 4075-4079 ◽  
Author(s):  
W. Weber ◽  
A. Bischof ◽  
R. Allenspach ◽  
C. H. Back ◽  
J. Fassbender ◽  
...  
1990 ◽  
Vol 55 (1-4) ◽  
pp. 1113-1117 ◽  
Author(s):  
Yufang Zheng ◽  
Qinghui Xiao ◽  
Zhengfang Yu ◽  
Jiangao Zhang

Nanomaterials ◽  
2020 ◽  
Vol 10 (5) ◽  
pp. 884
Author(s):  
Kenny L. Alvarez ◽  
José Manuel Martín ◽  
Nerea Burgos ◽  
Mihail Ipatov ◽  
Lourdes Domínguez ◽  
...  

We present the evolution of magnetic anisotropy obtained from the magnetization curve of (Fe0.76Si0.09B0.10P0.05)97.5Nb2.0Cu0.5 amorphous and nanocrystalline alloy produced by a gas atomization process. The material obtained by this process is a powder exhibiting amorphous character in the as-atomized state. Heat treatment at 480 °C provokes structural relaxation, while annealing the powder at 530 °C for 30 and 60 min develops a fine nanocrystalline structure. Magnetic anisotropy distribution is explained by considering dipolar effects and the modified random anisotropy model.


2006 ◽  
Vol 56 (1) ◽  
pp. 51-59 ◽  
Author(s):  
Frantisek Maca ◽  
Alexander B. Shick ◽  
Josef Redinger ◽  
Peter M. Oppeneer

Author(s):  
A.E.M. De Veirman ◽  
F.J.G. Hakkens ◽  
W.M.J. Coene ◽  
F.J.A. den Broeder

There is currently great interest in magnetic multilayer (ML) thin films (see e.g.), because they display some interesting magnetic properties. Co/Pd and Co/Au ML systems exhibit perpendicular magnetic anisotropy below certain Co layer thicknesses, which makes them candidates for applications in the field of magneto-optical recording. It has been found that the magnetic anisotropy of a particular system strongly depends on the preparation method (vapour deposition, sputtering, ion beam sputtering) as well as on the substrate, underlayer and deposition temperature. In order to get a better understanding of the correlation between microstructure and properties a thorough cross-sectional transmission electron microscopy (XTEM) study of vapour deposited Co/Pd and Co/Au (111) MLs was undertaken (for more detailed results see ref.).The Co/Pd films (with fixed Pd thickness of 2.2 nm) were deposited on mica substrates at substrate temperatures Ts of 20°C and 200°C, after prior deposition of a 100 nm Pd underlayer at 450°C.


1985 ◽  
Vol 46 (C6) ◽  
pp. C6-305-C6-308 ◽  
Author(s):  
F. Bolzoni ◽  
F. Leccabue ◽  
L. Pareti ◽  
J. L. Sanchez

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