Characteristics of ArF-excimer-laser-induced 1.9-eV emission bands in type-III and soot-remelted silicas

1993 ◽  
Vol 48 (10) ◽  
pp. 6952-6956 ◽  
Author(s):  
Nobu Kuzuu ◽  
Yasutaka Matsumoto ◽  
Masataka Murahara
Keyword(s):  
Excimer Laser ◽  
Type Iii ◽  
Arf Excimer Laser

Excimer Laser Induced 5.8 eV Absorption and 1.9 eV Emission Bands in Fused Silicas

1991 ◽  
Vol 244 ◽  
Author(s):  
Nobu Kuzuu ◽  
Yasutaka Matsumoto ◽  
Masataka Murahara
Keyword(s):  
Absorption Band ◽  
Excimer Laser ◽  
Fused Silica ◽  
Absorption Bands ◽  
Type Iii ◽  
Arf Excimer Laser ◽  
The Creation ◽  
The Difference ◽  
Order Structures ◽  
Reducing Condition

ABSTRACTCharacteristics of ArF excimer laser induced 1.9 eV emission and 5.8 eV absorption bands in type III and soot remelted silicas were investigated. In a type III silica synthesized in a reducing condition, an absorption band at 5.8 eV band is induced. The creation of this band can be prevented by annealing in an atmosphere of He. In the soot remelted silicas with and without OH, the creation of the 5.8 eV band is strongly promoted by annealing in H2. An emission band at 1.9 eV is induced in a type III fused silica synthesized in an oxydizing condition and soot remelted silica containing OH. When annealing in He, creation of the 1.9 eV band is strongly promoted in the former but suppressed in the latter sample. This difference is derived from the difference of higher order structures between the type III and the soot remelted silicas.

High Resolution Displacement of Functional Groups onto Fluorocarbon Resin Surface by Using ArF Excimer Laser

1996 ◽  
Vol 451 ◽  
Author(s):  
T. Shimizu ◽  
M. Murahara
Keyword(s):  
Contact Angle ◽  
High Resolution ◽  
Laser Beam ◽  
Thin Layer ◽  
Functional Groups ◽  
Excimer Laser ◽  
Laser Fluence ◽  
Large Area ◽  
Three Solutions ◽  
Arf Excimer Laser

ABSTRACTA Fluorocarbon resin surface was selectively modified by irradiation with a ArF laser beam through a thin layer of NaAlO2, B(OH)3, or H2O solution to give a hydrophilic property. As a result, with low fluence, the surface was most effectively modified with the NaAlO2 solution among the three solutions. However, the contact angle in this case changed by 10 degrees as the fluence changed only 1mJ/cm2. When modifying a large area of the surface, high resolution displacement could not be achieved because the laser beam was not uniform in displacing functional groups. Thus, the laser fluence was successfully made uniform by homogenizing the laser beam; the functional groups were replaced on the fluorocarbon resin surface with high resolution, which was successfully modified to be hydrophilic by distributing the laser fluence uniformly.

Characterization of GaAs surfaces treated with phosphine gas photodecomposed by an ArF excimer laser

1998 ◽  
Vol 72 (12) ◽  
pp. 1472-1474 ◽  
Author(s):  
Takashi Sugino ◽  
Hideaki Ninomiya ◽  
Junji Shirafuji ◽  
Koichiro Matsuda
Keyword(s):  
Excimer Laser ◽  
Arf Excimer Laser

Transmission of corneal collagen during arf excimer laser ablation

1993 ◽  
Vol 13 (2) ◽  
pp. 204-210 ◽  
Author(s):  
M. N. Ediger ◽  
G. H. Pettit ◽  
R. P. Weiblinger ◽  
C. H. Chen
Keyword(s):  
Laser Ablation ◽  
Excimer Laser ◽  
Excimer Laser Ablation ◽  
Arf Excimer Laser ◽  
Corneal Collagen
Sign in / Sign up

Export Citation Format

Share Document