Temporal evolution of the longitudinal- and transverse-phonon distributions in nonequilibrium metal films

1991 ◽  
Vol 43 (12) ◽  
pp. 9511-9514 ◽  
Author(s):  
N. Perrin ◽  
M. N. Wybourne
2009 ◽  
Vol 1230 ◽  
Author(s):  
Manuel Ligges ◽  
Carla Streubühr ◽  
Thorsten Brazda ◽  
Oliver Posth ◽  
Christph Hassel ◽  
...  

AbstractWe show that time-resolved electron diffraction is capable of revealing the ultrafast lattice heating in thin metal films following excitation by a femtosecond laser pulse. The build-up of the lattice temperature leads to a reduction of the diffraction intensity of the various diffraction orders due to the Debye-Waller-effect. We also observed a reduction of the transmitted (000)-signal which exhibits the same temporal evolution as the diffraction signals.


Author(s):  
Klaus-Ruediger Peters ◽  
Samuel A. Green

High magnification imaging of macromolecules on metal coated biological specimens is limited only by wet preparation procedures since recently obtained instrumental resolution allows visualization of topographic structures as smal l as 1-2 nm. Details of such dimensions may be visualized if continuous metal films with a thickness of 2 nm or less are applied. Such thin films give sufficient contrast in TEM as well as in SEM (SE-I image mode). The requisite increase in electrical conductivity for SEM of biological specimens is achieved through the use of ligand mediated wet osmiuum impregnation of the specimen before critical point (CP) drying. A commonly used ligand is thiocarbohvdrazide (TCH), first introduced to TEM for en block staining of lipids and glvcomacromolecules with osmium black. Now TCH is also used for SEM. However, after ligand mediated osinification nonspecific osmium black precipitates were often found obscuring surface details with large diffuse aggregates or with dense particular deposits, 2-20 nm in size. Thus, only low magnification work was considered possible after TCH appl ication.


Author(s):  
L. M. Gignac ◽  
K. P. Rodbell

As advanced semiconductor device features shrink, grain boundaries and interfaces become increasingly more important to the properties of thin metal films. With film thicknesses decreasing to the range of 10 nm and the corresponding features also decreasing to sub-micrometer sizes, interface and grain boundary properties become dominant. In this regime the details of the surfaces and grain boundaries dictate the interactions between film layers and the subsequent electrical properties. Therefore it is necessary to accurately characterize these materials on the proper length scale in order to first understand and then to improve the device effectiveness. In this talk we will examine the importance of microstructural characterization of thin metal films used in semiconductor devices and show how microstructure can influence the electrical performance. Specifically, we will review Co and Ti silicides for silicon contact and gate conductor applications, Ti/TiN liner films used for adhesion and diffusion barriers in chemical vapor deposited (CVD) tungsten vertical wiring (vias) and Ti/AlCu/Ti-TiN films used as planar interconnect metal lines.


1988 ◽  
Vol 49 (C8) ◽  
pp. C8-1657-C8-1658 ◽  
Author(s):  
C. M. Schneider ◽  
J. J. de Miguel ◽  
P. Bressler ◽  
J. Garbe ◽  
S. Ferrer ◽  
...  
Keyword(s):  

2002 ◽  
Vol 7 (2) ◽  
pp. 45-52
Author(s):  
L. Jakučionis ◽  
V. Kleiza

Electrical properties of conductive thin films, that are produced by vacuum evaporation on the dielectric substrates, and which properties depend on their thickness, usually are anisotropic i.e. they have uniaxial anisotropy. If the condensate grow on dielectric substrates on which plane electrical field E is created the transverse voltage U⊥ appears on the boundary of the film in the direction perpendicular to E. Transverse voltage U⊥ depends on the angle γ between the applied magnetic field H and axis of light magnetisation. When electric field E is applied to continuous or grid layers, U⊥ and resistance R of layers are changed by changing γ. It means that value of U⊥ is the measure of anisotropy magnitude. Increasing voltage U0 , which is created by E, U⊥ increases to certain magnitude and later decreases. The anisotropy of continuous thin layers is excited by inequality of conductivity tensor components σ0 ≠ σ⊥. The reason of anisotropy is explained by the model which shows that properties of grain boundaries are defined by unequal probability of transient of charge carrier.


2008 ◽  
Author(s):  
Elena Torres Alvarez ◽  
Alicia Escribano ◽  
María Jesús. Turrero ◽  
Pedro Luis. Martín ◽  
Javier Peña ◽  
...  
Keyword(s):  

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