Symmetry analysis and uniaxial-stress effect on the low-field electroreflectance of Si from 3.0 to 4.0 eV

1976 ◽  
Vol 14 (4) ◽  
pp. 1577-1592 ◽  
Author(s):  
K. Kondo ◽  
A. Moritani
2019 ◽  
Vol 291 ◽  
pp. 11-14 ◽  
Author(s):  
Gang Bai ◽  
Qiyun Xie ◽  
Jie Xu ◽  
Cunfa Gao

1982 ◽  
Vol 51 (5) ◽  
pp. 1345-1346 ◽  
Author(s):  
Asako Kawamori ◽  
Toshio Watanabe ◽  
Hiromu Kato

1978 ◽  
Vol 21 (1) ◽  
pp. 527-528
Author(s):  
H. Shimizu ◽  
N. Yasuda ◽  
S. Fujimoto ◽  
K. Yoshino ◽  
Y. Inuishi

1977 ◽  
Vol 15 (2) ◽  
pp. 812-815 ◽  
Author(s):  
K. Kondo ◽  
A. Moritani
Keyword(s):  

1991 ◽  
Vol 60 (2) ◽  
pp. 384-386 ◽  
Author(s):  
Yuichi Motoi ◽  
Katsumi Fujimoto ◽  
Hiromoto Uwe ◽  
Tunetaro Sakudo

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