Field-Induced Electron Spin Resonance of Site-Selective Carrier Accumulation in Field-Effect Transistors Composed of Organic Semiconductor Solid Solutions

2021 ◽  
Vol 16 (3) ◽  
Author(s):  
Hiroyuki Matsui ◽  
Eiji Takahashi ◽  
Seiji Tsuzuki ◽  
Kazuo Takimiya ◽  
Tatsuo Hasegawa
1977 ◽  
Vol 55 (20) ◽  
pp. 3554-3558 ◽  
Author(s):  
J. P. Michaut ◽  
J. Roncin

Nitrogen and proton coupling tensors have been measured for the [Formula: see text] radical trapped in five different single crystal matrices. As all isotropic coupling constants are the same within experimental error (aN = 21.2 G, aH = 28.4 G), no measurable crystal field effect is found. In these solids the motions of the radical depend on the dimension of the trapping cage and the motions of the surrounding molecules.


2005 ◽  
Vol 483-485 ◽  
pp. 593-596 ◽  
Author(s):  
David J. Meyer ◽  
Morgen S. Dautrich ◽  
Patrick M. Lenahan ◽  
Aivars J. Lelis

Utilizing an very sensitive electron spin resonance (ESR) technique, spin dependent recombination (SDR) we have identified interface and near interface trapping centers in 4H and 6H SiC/SiO2 metal oxide semiconductor field effect transistors (MOSFETs). We extend our group’s earlier observations on 6H devices to the more technologically important 4H system and find that several centers can play important roles in limiting the performance of SiC based MOSFETs.


1965 ◽  
Vol 12 (116) ◽  
pp. 433-435 ◽  
Author(s):  
G. D. Wignall ◽  
J. E. Enderby ◽  
C. E. W. Hahn ◽  
J. M. Titman

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