High-Precision Multiparameter Weak Measurement with Hermite-Gaussian Pointer

2020 ◽  
Vol 13 (3) ◽  
Author(s):  
Binke Xia ◽  
Jingzheng Huang ◽  
Chen Fang ◽  
Hongjing Li ◽  
Guihua Zeng
Keyword(s):  
High Precision ◽  
Weak Measurement

Retaining high precision and sensitivity for an extended range of phase estimation via modulated weak measurement

2018 ◽  
Vol 113 (19) ◽  
pp. 191103 ◽  
Author(s):  
Zhaoxue Li ◽  
Jiangdong Qiu ◽  
Linguo Xie ◽  
Lan Luo ◽  
Xiong Liu ◽  
...  
Keyword(s):  
High Precision ◽  
Weak Measurement ◽  
Phase Estimation ◽  
Extended Range

scholarly journals High-precision temperature sensor based on weak measurement

2019 ◽  
Vol 27 (15) ◽  
pp. 21455 ◽  
Author(s):  
Yanjia Li ◽  
Hongjing Li ◽  
Jingzheng Huang ◽  
Cheng Fang ◽  
Miaomiao Liu ◽  
...  
Keyword(s):  
High Precision ◽  
Temperature Sensor ◽  
Weak Measurement ◽  
Precision Temperature

High-precision temperature measurement with adjustable operating range based on weak measurement

2021 ◽  
Vol 54 (8) ◽  
pp. 085501
Author(s):  
Miaomiao Liu ◽  
Hongjing Li ◽  
Gongling Wang ◽  
Binke Xia ◽  
Jingzheng Huang ◽  
...  
Keyword(s):  
Temperature Measurement ◽  
High Precision ◽  
Weak Measurement ◽  
Operating Range ◽  
Precision Temperature

High-precision temperature measurement based on weak measurement using nematic liquid crystals

2018 ◽  
Vol 112 (23) ◽  
pp. 231901 ◽  
Author(s):  
Hongjing Li ◽  
Jing-Zheng Huang ◽  
Yang Yu ◽  
Yanjia Li ◽  
Chen Fang ◽  
...  
Keyword(s):  
Liquid Crystals ◽  
Temperature Measurement ◽  
High Precision ◽  
Nematic Liquid Crystals ◽  
Weak Measurement ◽  
Precision Temperature

Weak Measurements in Nano-optics

2020 ◽  
Vol 5 (3) ◽  
pp. 191-213
Author(s):  
Niladri Modak ◽  
Ankit K. Singh ◽  
Shyamal Guchhait ◽  
Athira BS ◽  
Mandira Pal ◽  
...  
Keyword(s):  
High Precision ◽  
Spectral Response ◽  
Weak Measurement ◽  
Optical Systems ◽  
Physical Parameters ◽  
Weak Measurements ◽  
Temporal Shift ◽  
Measuring Device ◽  
Weak Value ◽  
Weak Value Amplification

Background: Weak measurement involves weak coupling between the system and the measuring device (pointer) enables large amplification and high precision measurement of small physical parameters. The outcome of this special measurement procedure involving nearly mutually orthogonal pre- and post-selection of states in such weakly interacting systems leads to weak value that can become exceedingly large and lie outside the eigenvalue spectrum of the measured observable. This unprecedented ability of weak value amplification of small physical parameters has been successfully exploited for various metrological applications in the optical domain and beyond. Even though it is a quantum mechanical concept, it can be understood using the classical electromagnetic theory of light and thus can be realized in classical optics. Objective: Here, we briefly review the basic concepts of weak measurement and weak value amplification, provide illustrative examples of its implementation in various optical domains. The applications involve measuring ultra-sensitive beam deflections, high precision measurements of angular rotation, phase shift, temporal shift, frequency shift and so forth, and expand this extraordinary concept in the domain of nano-optics and plasmonics. Methods: In order to perform weak value amplification, we have used Gaussian beam and spectral response as the pointer subsequently. The polarization state associated with the pointer is used as pre and post-selection device. Results: We reveal the weak value amplification of sub-wavelength optical effects namely the Goos-Hänchen shift and the spin hall shift. Further, we demonstrate weak measurements using spectral line shape of resonance as a natural pointer, enabling weak value amplification beyond the conventional limit, demonstrating natural weak value amplification in plasmonic Fano resonances and so forth. The discussed concepts could have useful implications in various nano-optical systems to amplify tiny signals or effects. Conclusion: The emerging prospects of weak value amplification towards the development of novel optical weak measurement devices for metrological applications are extensively discussed.

Automatic measurement of SAED patterns from asbestos minerals

1988 ◽  
Vol 46 ◽  
pp. 846-847
Author(s):  
J. C. Russ ◽  
T. Taguchi ◽  
P. M. Peters ◽  
E. Chatfield ◽  
J. C. Russ ◽  
...  
Keyword(s):  
Diffraction Pattern ◽  
High Precision ◽  
Diffraction Data ◽  
Automatic Measurement ◽  
Automatic Method ◽  
Important Method ◽  
X Ray ◽  
Integrated Intensity ◽  
Asbestiform Minerals ◽  
True Center

Conventional SAD patterns as obtained in the TEM present difficulties for identification of materials such as asbestiform minerals, although diffraction data is considered to be an important method for making this purpose. The preferred orientation of the fibers and the spotty patterns that are obtained do not readily lend themselves to measurement of the integrated intensity values for each d-spacing, and even the d-spacings may be hard to determine precisely because the true center location for the broken rings requires estimation. We have implemented an automatic method for diffraction pattern measurement to overcome these problems. It automatically locates the center of patterns with high precision, measures the radius of each ring of spots in the pattern, and integrates the density of spots in that ring. The resulting spectrum of intensity vs. radius is then used just as a conventional X-ray diffractometer scan would be, to locate peaks and produce a list of d,I values suitable for search/match comparison to known or expected phases.

On effects of non-systematic reflections on weak-beam images of partial dislocations

1991 ◽  
Vol 49 ◽  
pp. 688-689
Author(s):  
K. Z. Botros ◽  
S. S. Sheinin
Keyword(s):  
High Precision ◽  
Stacking Fault ◽  
Important Application ◽  
Stacking Fault Energy ◽  
Sharp Peak ◽  
Weak Beam ◽  
Partial Dislocations ◽  
Deviation Parameter ◽  
Beam Diffraction

The main features of weak beam images of dislocations were first described by Cockayne et al. using calculations of intensity profiles based on the kinematical and two beam dynamical theories. The feature of weak beam images which is of particular interest in this investigation is that intensity profiles exhibit a sharp peak located at a position very close to the position of the dislocation in the crystal. This property of weak beam images of dislocations has an important application in the determination of stacking fault energy of crystals. This can easily be done since the separation of the partial dislocations bounding a stacking fault ribbon can be measured with high precision, assuming of course that the weak beam relationship between the positions of the image and the dislocation is valid. In order to carry out measurements such as these in practice the specimen must be tilted to "good" weak beam diffraction conditions, which implies utilizing high values of the deviation parameter Sg.

Digital differential hysteresis iimage processing displays what the microscope acquires but the eye can't see

1995 ◽  
Vol 53 ◽  
pp. 642-643
Author(s):  
Klaus-Ruediger Peters
Keyword(s):  
Image Processing ◽  
Visual System ◽  
High Precision ◽  
Image Data ◽  
Processing Technology ◽  
Output Data ◽  
Contrast Resolution ◽  
Pixel Intensity ◽  
Data Reading ◽  
Hysteresis Properties

Differential hysteresis processing is a new image processing technology that provides a tool for the display of image data information at any level of differential contrast resolution. This includes the maximum contrast resolution of the acquisition system which may be 1,000-times higher than that of the visual system (16 bit versus 6 bit). All microscopes acquire high precision contrasts at a level of <0.01-25% of the acquisition range in 16-bit - 8-bit data, but these contrasts are mostly invisible or only partially visible even in conventionally enhanced images. The processing principle of the differential hysteresis tool is based on hysteresis properties of intensity variations within an image.Differential hysteresis image processing moves a cursor of selected intensity range (hysteresis range) along lines through the image data reading each successive pixel intensity. The midpoint of the cursor provides the output data. If the intensity value of the following pixel falls outside of the actual cursor endpoint values, then the cursor follows the data either with its top or with its bottom, but if the pixels' intensity value falls within the cursor range, then the cursor maintains its intensity value.

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