scholarly journals Immunogold Staining Following Freeze Substitution and Low Temperature Embedding after Chemical Fixation or after Cryoimmobilization for Transmission Electron Microscopy (TEM)

2008 ◽  
Vol 2008 (6) ◽  
pp. pdb.prot5017-pdb.prot5017 ◽  
Author(s):  
J. N. Skepper ◽  
J. M. Powell
Keyword(s):  
Electron Microscopy ◽  
Transmission Electron Microscopy ◽  
Low Temperature ◽  
Freeze Substitution ◽  
Chemical Fixation ◽  
Immunogold Staining ◽  
Transmission Electron

Low-temperature annealing of YBa2Cu3O7-x

1992 ◽  
Vol 50 (1) ◽  
pp. 88-89
Author(s):  
R.L. Sabatini ◽  
Yimei Zhu ◽  
Masaki Suenaga ◽  
A.R. Moodenbaugh
Keyword(s):  
Electron Microscopy ◽  
Transmission Electron Microscopy ◽  
Low Temperature ◽  
Oxygen Diffusion ◽  
Diffusion Rate ◽  
Oxygen Depletion ◽  
Low Temperature Annealing ◽  
Transmission Electron ◽  
Microstructural Effects ◽  
Oxygen Diffusion Rate

Low temperature annealing (<400°C) of YBa2Cu3O7x in a ozone containing oxygen atmosphere is sometimes carried out to oxygenate oxygen deficient thin films. Also, this technique can be used to fully oxygenate thinned TEM specimens when oxygen depletion in thin regions is suspected. However, the effects on the microstructure nor the extent of oxygenation of specimens has not been documented for specimens exposed to an ozone atmosphere. A particular concern is the fact that the ozone gas is so reactive and the oxygen diffusion rate at these temperatures is so slow that it may damage the specimen by an over-reaction. Thus we report here the results of an investigation on the microstructural effects of exposing a thinned YBa2Cu3O7-x specimen in an ozone atmosphere using transmission electron microscopy and energy loss spectroscopy techniques.

scholarly journals Characterization of Gaas/Si/GaAs Heterointerfaces

1989 ◽  
Vol 148 ◽  
Author(s):  
Zuzanna Liliental-Weber ◽  
Raymond P. Mariella
Keyword(s):  
Electron Microscopy ◽  
Transmission Electron Microscopy ◽  
Low Temperature ◽  
Defect Density ◽  
Si Substrate ◽  
Reverse Polarity ◽  
Si Substrates ◽  
Transmission Electron ◽  
Metal Semiconductor Metal

ABSTRACTTransmission electron microscopy of GaAs grown on Si for metal-semiconductor-metal photodetectors is presented in this paper. Two kinds of samples are compared: GaAs grown on a 15 Å Si epilayer grown on GaAs, and GaAs grown at low temperature (300°C) on Si substrates. It is shown that the GaAs epitaxial layer grown on thin Si layer has reverse polarity to the substrate (antiphase relation). Higher defect density is observed for GaAs grown on Si substrate. This higher defect density correlates with an increased device speed, but with reduced sensitivity.

scholarly journals In situ environmental HRTEM discloses low temperature carbon soot oxidation by ceria–zirconia at the nanoscale

2019 ◽  
Vol 55 (27) ◽  
pp. 3876-3878 ◽  
Author(s):  
Eleonora Aneggi ◽  
Jordi Llorca ◽  
Alessandro Trovarelli ◽  
Mimoun Aouine ◽  
Philippe Vernoux
Keyword(s):  
Electron Microscopy ◽  
Transmission Electron Microscopy ◽  
Low Temperature ◽  
Room Temperature ◽  
Soot Oxidation ◽  
Environmental Transmission ◽  
Transmission Electron ◽  
Carbon Soot ◽  
Environmental Transmission Electron Microscopy

In situ environmental transmission electron microscopy discloses room temperature carbon soot oxidation by ceria–zirconia at the nanoscale.

Structural transformation of a kaolinite and calcite mixture to gehlenite and anorthite

2003 ◽  
Vol 18 (2) ◽  
pp. 475-481 ◽  
Author(s):  
Karfa Traoré ◽  
Philippe Blanchart
Keyword(s):  
Electron Microscopy ◽  
Phase Diagram ◽  
Transmission Electron Microscopy ◽  
Electron Diffraction ◽  
Low Temperature ◽  
Orientation Relationship ◽  
Interlayer Spacing ◽  
Direct Transition ◽  
Transmission Electron ◽  
Successive Phase

Kaolinite mixed with calcite was sintered at low temperature (1100 °C; 5 °C/min). The successive phase transformations are metakaolinite to gehlenite and then anorthite, although the available phase diagram indicates a direct anorthite recrystallization. Transmission electron microscopy and electron diffraction studies of nanocrystallites revealed that the transformation path is favored by the structural similarities of phases. In particular, the pseudolayers of gehlenite have a major orientation relationship with the initial metakaolinite layers. The gehlenite axis, [001]G, is parallel to the metakaolinite axis, [001]A. This direct transition is favored by the existence of Si tetrahedral units and 4–fold–coordinated Al in both structures. Ca atoms, initially in the interlayer spacing of metakaolinite, remain in the interlayers of gehlenite. During the second transformation step, anorthite recrystallizes from gehlenite with axis [020]A parallel to [210]G. It is proposed that this orientation relationship is favored by the orientation and shape of Ca-atom channels through both structures, along [001]G and [100]A axes.

LOW-Temperature Epitaxial Growth of GaAs on Si Substrates by MBE

1992 ◽  
Vol 263 ◽  
Author(s):  
Ting-Yen Chiang ◽  
En-Huery Liu ◽  
Der-Hwa Yiin ◽  
Tri-Rung Yew
Keyword(s):  
Electron Microscopy ◽  
Transmission Electron Microscopy ◽  
Low Temperature ◽  
Epitaxial Growth ◽  
Defect Density ◽  
Solution Treatment ◽  
Plan View ◽  
Si Substrates ◽  
Gaas On Si ◽  
Transmission Electron

ABSTRACTThis paper presents results of the low—temperature epitaxial growth of GaAs on Si substrates with orientation 1°—4° off (100) by molecular beam epitaxy (MBE). The epitaxial growth ·is carried out on Si wafers subjected to HF solution treatment by “spin-etch” technique before the wafer is transferred to the entry chamber of MBE system. Methods used for reducing defect density in the epitaxial layers are proposed. The characterization techniques include cross-sectional transmission electron microscopy (XTEM), plan-view transmission electron microscopy, scanning electron microscopy (S EM), and double crystal X-ray diffraction (DCXRD). Epitaxial films with a full width at half—maximum (FWHM) of about 310 arcsec measured by DCXRD are obtained without annealing.-

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