Photo-Electric Properties of Thin Films of Alkali Metal. II. Phenomena at High Temperatures

1926 ◽  
Vol 64 ◽  
pp. 128 ◽  
Author(s):  
Herbert E. Ives
2015 ◽  
Vol 764-765 ◽  
pp. 138-142 ◽  
Author(s):  
Fa Ta Tsai ◽  
Hsi Ting Hou ◽  
Ching Kong Chao ◽  
Rwei Ching Chang

This work characterizes the mechanical and opto-electric properties of Aluminum-doped zinc oxide (AZO) thin films deposited by atomic layer deposition (ALD), where various depositing temperature, 100, 125, 150, 175, and 200 °C are considered. The transmittance, microstructure, electric resistivity, adhesion, hardness, and Young’s modulus of the deposited thin films are tested by using spectrophotometer, X-ray diffraction, Hall effect analyzer, micro scratch, and nanoindentation, respectively. The results show that the AZO thin film deposited at 200 °C behaves the best electric properties, where its resistance, Carrier Concentration and mobility reach 4.3×10-4 Ωcm, 2.4×1020 cm-3, and 60.4 cm2V-1s-1, respectively. Furthermore, microstructure of the AZO films deposited by ALD is much better than those deposited by sputtering.


2019 ◽  
Vol 293 ◽  
pp. 128-135 ◽  
Author(s):  
P. Schmid ◽  
F. Triendl ◽  
C. Zarfl ◽  
S. Schwarz ◽  
W. Artner ◽  
...  

2000 ◽  
Vol 45 (3-4) ◽  
pp. 143-148 ◽  
Author(s):  
A Shutou ◽  
T Matsui ◽  
H Tsuda ◽  
H Mabuchi ◽  
K Morii

2003 ◽  
Vol 293 (1) ◽  
pp. 135-143
Author(s):  
M. Pereira ◽  
I. Boerasu ◽  
M. J. M. Gomes ◽  
B. Watts ◽  
F. Leccabue

2013 ◽  
Vol 102 (1) ◽  
pp. 012102 ◽  
Author(s):  
B. A. Assaf ◽  
T. Cardinal ◽  
P. Wei ◽  
F. Katmis ◽  
J. S. Moodera ◽  
...  

2014 ◽  
Vol 12 (0) ◽  
pp. 373-376 ◽  
Author(s):  
Koji Ichikawa ◽  
Takeshi Yokota ◽  
Manabu Gomi

2014 ◽  
Vol 61 (S1) ◽  
pp. S330-S332
Author(s):  
T. Matsumoto ◽  
N. Suzuki ◽  
S. Kanamaru ◽  
H. Hashimoto ◽  
M. Nakanishi ◽  
...  

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