Chapter 10. L2 learning and the frequency and quality of written languaging

2020 ◽  
pp. 220-240
Author(s):  
Masako Ishikawa ◽  
Andrea Révész
Keyword(s):  
L2 Learning

scholarly journals Towards a better understanding of the L2 Learning Experience, the Cinderella of the L2 Motivational Self System

2019 ◽  
Vol 9 (1) ◽  
pp. 19-30 ◽  
Author(s):  
Zoltán Dörnyei
Keyword(s):  
Language Learning ◽  
Learning Experience ◽  
Strong Predictor ◽  
Empirical Studies ◽  
Motivated Behavior ◽  
L2 Motivational Self System ◽  
L2 Learning ◽  
Main Dimension ◽  
Self System

The theoretical emphasis within the L2 Motivational Self System has typically been on the two future self-guides representing possible (ideal and ought-to) selves, leaving the third main dimension of the construct, the L2 Learning Experience, somewhat undertheorized. Yet, this third component is not secondary in importance, as evidenced by empirical studies that consistently indicate that the L2 Learning Experience is not only a strong predictor of various criterion measures but is often the most powerful predictor of motivated behavior. This paper begins with an analysis of possible reasons for this neglect and then draws on the notion of student engagement in educational psychology to offer a theoretical framework for the concept. It is proposed that the L2 Learning Experience may be defined as the perceived quality of the learners’ engagement with various aspects of the language learning process.

A re-examination of pair dynamics and L2 learning opportunities in collaborative writing

2019 ◽  
pp. 136216881989094 ◽  
Author(s):  
Meixiu Zhang
Keyword(s):  
Language Use ◽  
Collaborative Writing ◽  
Learning Opportunities ◽  
Private Speech ◽  
The Other ◽  
Dyadic Interaction ◽  
Task Management ◽  
Pair Member ◽  
L2 Learning

Pair dynamics has received much attention in collaborative writing (CW) research. Prior research on the link between pair dynamics and L2 learning opportunities (often operationalized as language related episodes; LREs) in CW has primarily focused on the quantity, length, and outcome of LREs, but rarely considered the quality of the LREs. Also, scarce research has considered the fluctuating nature of pair dynamics and its impact on the L2 learning opportunities. This study employs an approach of detecting pair dynamics that accounts for its fluid nature to investigate how learners’ collaboration in various aspects of CW may influence the quantity, quality, focus, and outcome of the LREs in CW tasks by intermediate L2 learners. Results indicated that while discussion on task management and organization generally took up a limited portion of dyadic interaction, unbalanced contribution to these aspects, especially when coupled with an unequal involvement in content elicitation, greatly affected the quantity and quality of L2 learning opportunities in CW. Also, pairs who participated unequally in discussing language use might still generate many LREs. However, a moderate portion of these LREs represented one learner’s externalized private speech, and thus might not be very beneficial for the other pair member.

scholarly journals Assessing the quality of TTS audio in the LARA learning-by-reading platform

2021 ◽  
pp. 1-5
Author(s):  
Elham Akhlaghi ◽  
Anna Bączkowska ◽  
Harald Berthelsen ◽  
Branislav Bédi ◽  
Cathy Chua ◽  
...  
Keyword(s):  
Language Learning ◽  
Open Source ◽  
Computer Assisted ◽  
Computer Assisted Language Learning ◽  
Text To Speech ◽  
Human Voice ◽  
L2 Learning ◽  
Learning By Reading

A popular idea in Computer Assisted Language Learning (CALL) is to use multimodal annotated texts, with annotations typically including embedded audio and translations, to support L2 learning through reading. An important question is how to create the audio, which can be done either through human recording or by a Text-To-Speech (TTS) synthesis engine. We may reasonably expect TTS to be quicker and easier, but humans to be of higher quality. Here, we report a study using the open-source LARA platform and ten languages. Samples of LARA audio totaling about three and a half minutes were provided for each language in both human and TTS form; subjects used a web form to compare different versions of the same item and rate the voices as a whole. Although human voice was more often preferred, TTS achieved higher ratings in some languages and was close in others.

Immunoferritin localization of intracellular antigens in positively stained frozen sections

1978 ◽  
Vol 36 (2) ◽  
pp. 168-169
Author(s):  
K. T. Tokuyasu
Keyword(s):  
Surface Tension ◽  
Water Surface ◽  
Thin Layers ◽  
The Other ◽  
Positive Staining ◽  
Frozen Sections ◽  
The Past ◽  
Ultrathin Frozen Sections ◽  
Definition Of

During the past investigations of immunoferritin localization of intracellular antigens in ultrathin frozen sections, we found that the degree of negative staining required to delineate u1trastructural details was often too dense for the recognition of ferritin particles. The quality of positive staining of ultrathin frozen sections, on the other hand, has generally been far inferior to that attainable in conventional plastic embedded sections, particularly in the definition of membranes. As we discussed before, a main cause of this difficulty seemed to be the vulnerability of frozen sections to the damaging effects of air-water surface tension at the time of drying of the sections.Indeed, we found that the quality of positive staining is greatly improved when positively stained frozen sections are protected against the effects of surface tension by embedding them in thin layers of mechanically stable materials at the time of drying (unpublished).

Lithography below 100 nm

1983 ◽  
Vol 41 ◽  
pp. 96-99
Author(s):  
L. D. Jackel
Keyword(s):  
Spatial Distribution ◽  
Electron Beam ◽  
Electron Scattering ◽  
Electron Beam Lithography ◽  
Substrate Material ◽  
Local Electron ◽  
Electron Dose ◽  
Positive Resist ◽  
Exposure Process

Most production electron beam lithography systems can pattern minimum features a few tenths of a micron across. Linewidth in these systems is usually limited by the quality of the exposing beam and by electron scattering in the resist and substrate. By using a smaller spot along with exposure techniques that minimize scattering and its effects, laboratory e-beam lithography systems can now make features hundredths of a micron wide on standard substrate material. This talk will outline sane of these high- resolution e-beam lithography techniques.We first consider parameters of the exposure process that limit resolution in organic resists. For concreteness suppose that we have a “positive” resist in which exposing electrons break bonds in the resist molecules thus increasing the exposed resist's solubility in a developer. Ihe attainable resolution is obviously limited by the overall width of the exposing beam, but the spatial distribution of the beam intensity, the beam “profile” , also contributes to the resolution. Depending on the local electron dose, more or less resist bonds are broken resulting in slower or faster dissolution in the developer.

Convergent Beam Electron Diffraction

1978 ◽  
Vol 36 (3) ◽  
pp. 304-315
Author(s):  
G. Lehmpfuhl
Keyword(s):  
Electron Diffraction ◽  
Diffraction Pattern ◽  
Crystal Surface ◽  
Diffraction Spot ◽  
Crystal Thickness ◽  
Large Area ◽  
Electron Microscopic ◽  
Additional Information ◽  
Microscopic Investigations

Introduction In electron microscopic investigations of crystalline specimens the direct observation of the electron diffraction pattern gives additional information about the specimen. The quality of this information depends on the quality of the crystals or the crystal area contributing to the diffraction pattern. By selected area diffraction in a conventional electron microscope, specimen areas as small as 1 µ in diameter can be investigated. It is well known that crystal areas of that size which must be thin enough (in the order of 1000 Å) for electron microscopic investigations are normally somewhat distorted by bending, or they are not homogeneous. Furthermore, the crystal surface is not well defined over such a large area. These are facts which cause reduction of information in the diffraction pattern. The intensity of a diffraction spot, for example, depends on the crystal thickness. If the thickness is not uniform over the investigated area, one observes an averaged intensity, so that the intensity distribution in the diffraction pattern cannot be used for an analysis unless additional information is available.

Observability of Very Thick Specimen by Using Transmission Scanning Electron Microscope

1971 ◽  
Vol 29 ◽  
pp. 26-27
Author(s):  
K. Shibatomi ◽  
T. Yamanoto ◽  
H. Koike
Keyword(s):  
Electron Microscope ◽  
Image Quality ◽  
Scanning Electron Microscope ◽  
Chromatic Aberration ◽  
Image Contrast ◽  
Objective Lens ◽  
Thick Specimen ◽  
Transmission Electron ◽  
Scanning Electron

In the observation of a thick specimen by means of a transmission electron microscope, the intensity of electrons passing through the objective lens aperture is greatly reduced. So that the image is almost invisible. In addition to this fact, it have been reported that a chromatic aberration causes the deterioration of the image contrast rather than that of the resolution. The scanning electron microscope is, however, capable of electrically amplifying the signal of the decreasing intensity, and also free from a chromatic aberration so that the deterioration of the image contrast due to the aberration can be prevented. The electrical improvement of the image quality can be carried out by using the fascionating features of the SEM, that is, the amplification of a weak in-put signal forming the image and the descriminating action of the heigh level signal of the background. This paper reports some of the experimental results about the thickness dependence of the observability and quality of the image in the case of the transmission SEM.

The Current Situation in Chemical Stabilization of Biological Materials

1972 ◽  
Vol 30 ◽  
pp. 132-133
Author(s):  
John H. Luft
Keyword(s):  
Electron Microscopy ◽  
Electron Microscope ◽  
Osmium Tetroxide ◽  
Molecular Level ◽  
Cross Linking ◽  
Chemical Stabilization ◽  
Specimen Preparation ◽  
Sufficient Condition ◽  
Radio Telescopes

With information processing devices such as radio telescopes, microscopes or hi-fi systems, the quality of the output often is limited by distortion or noise introduced at the input stage of the device. This analogy can be extended usefully to specimen preparation for the electron microscope; fixation, which initiates the processing sequence, is the single most important step and, unfortunately, is the least well understood. Although there is an abundance of fixation mixtures recommended in the light microscopy literature, osmium tetroxide and glutaraldehyde are favored for electron microscopy. These fixatives react vigorously with proteins at the molecular level. There is clear evidence for the cross-linking of proteins both by osmium tetroxide and glutaraldehyde and cross-linking may be a necessary if not sufficient condition to define fixatives as a class.

Resistance Monitor and Control for Vacuum Evaporation of Metals and Carbon

1976 ◽  
Vol 34 ◽  
pp. 572-573
Author(s):  
Russell L. Steere ◽  
Eric F. Erbe ◽  
J. Michael Moseley
Keyword(s):  
Electronic Device ◽  
Point Sources ◽  
High Contrast ◽  
Variable Resistor ◽  
Quality Of Results ◽  
Low Contrast ◽  
Evaporation Source ◽  
And Control ◽  
At Will

We have designed and built an electronic device which compares the resistance of a defined area of vacuum evaporated material with a variable resistor. When the two resistances are matched, the device automatically disconnects the primary side of the substrate transformer and stops further evaporation.This approach to controlled evaporation in conjunction with the modified guns and evaporation source permits reliably reproducible multiple Pt shadow films from a single Pt wrapped carbon point source. The reproducibility from consecutive C point sources is also reliable. Furthermore, the device we have developed permits us to select a predetermined resistance so that low contrast high-resolution shadows, heavy high contrast shadows, or any grade in between can be selected at will. The reproducibility and quality of results are demonstrated in Figures 1-4 which represent evaporations at various settings of the variable resistor.

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