The inhibition of photosynthesis under water deficit conditions is more severe in flecked than uniform irradiance in rice (Oryza sativa) plants

2017 ◽  
Vol 44 (4) ◽  
pp. 464 ◽  
Author(s):  
Jiali Sun ◽  
Qiangqiang Zhang ◽  
Muhammad Adnan Tabassum ◽  
Miao Ye ◽  
Shaobing Peng ◽  
...  

Water deficit is considered the major environmental factor limiting leaf photosynthesis, and the physiological basis for decreased photosynthesis under water deficit has been intensively studied with steady irradiance. Leaves within a canopy experience a highly variable light environment in magnitude and time, but the effect of water deficit on photosynthesis in fluctuating irradiance is not well understood. Two rice cultivars with different drought tolerance, Champa and Yangliangyou 6 (YLY6), were hydroponically grown under well-watered, 15% (m/v) and 20% PEG (polyethylene glycol, 6000 Da) induced water deficit conditions. The inhibition of steady-state photosynthesis in Champa is more severe than YLY6. The maximum Rubisco carboxylation capacity (Vcmax) and maximum electron transport capacity (Jmax) were decreased under 20% PEG treatment in Champa, whereas less or no effect was observed in YLY6. The induction state (IS%, which indicates photosynthesis capacity after exposure of low-light period) of both leaf photosynthetic rate (A) and stomatal conductance (gs) was highly correlated, and was significantly decreased under water deficit conditions in both cultivars. Water deficit had no significant effect on the time required to reach 50 or 90% of the maximum photosynthetic rate (T50%,A and T90%,A) after exposure to high-light level, but significantly led to a greater decrease in photosynthetic rate in the low-light period under flecked irradiance (Amin-fleck) relative to photosynthetic rate in the same light intensity of continuously low-light period (Ainitial). The lower IS% of A and more severe decrease in Amin-fleck relative to Ainitial will lead to a more severe decrease in integrated CO2 fixation under water deficit in flecked compared with uniform irradiance.

Author(s):  
G.Y. Fan ◽  
J.M. Cowley

In recent developments, the ASU HB5 has been modified so that the timing, positioning, and scanning of the finely focused electron probe can be entirely controlled by a host computer. This made the asynchronized handshake possible between the HB5 STEM and the image processing system which consists of host computer (PDP 11/34), DeAnza image processor (IP 5000) which is interfaced with a low-light level TV camera, array processor (AP 400) and various peripheral devices. This greatly facilitates the pattern recognition technique initiated by Monosmith and Cowley. Software called NANHB5 is under development which, instead of employing a set of photo-diodes to detect strong spots on a TV screen, uses various software techniques including on-line fast Fourier transform (FFT) to recognize patterns of greater complexity, taking advantage of the sophistication of our image processing system and the flexibility of computer software.


Author(s):  
W. Lin ◽  
J. Gregorio ◽  
T.J. Holmes ◽  
D. H. Szarowski ◽  
J.N. Turner

A low-light level video microscope with long working distance objective lenses has been built as part of our integrated three-dimensional (3-D) light microscopy workstation (Fig. 1). It allows the observation of living specimens under sufficiently low light illumination that no significant photobleaching or alternation of specimen physiology is produced. The improved image quality, depth discrimination and 3-D reconstruction provides a versatile intermediate resolution system that replaces the commonly used dissection microscope for initial image recording and positioning of microelectrodes for neurobiology. A 3-D image is displayed on-line to guide the execution of complex experiments. An image composed of 40 optical sections requires 7 minutes to process and display a stereo pair.The low-light level video microscope utilizes long working distance objective lenses from Mitutoyo (10X, 0.28NA, 37 mm working distance; 20X, 0.42NA, 20 mm working distance; 50X, 0.42NA, 20 mm working distance). They provide enough working distance to allow the placement of microelectrodes in the specimen.


1998 ◽  
Author(s):  
Lianfa Bai ◽  
Qian Chen ◽  
Dekui Yin ◽  
Baomin Zhang

2016 ◽  
Author(s):  
Chao Liu ◽  
Xiao-hui Zhang ◽  
Qing-ping Hu ◽  
Yong-kang Chen

2010 ◽  
Vol 4 (2) ◽  
pp. 221-243 ◽  
Author(s):  
A.M.C. Dawes ◽  
D.J. Gauthier ◽  
S. Schumacher ◽  
N.H. Kwong ◽  
R. Binder ◽  
...  

Sign in / Sign up

Export Citation Format

Share Document