Ga-ion beam surface modification of glass using a custom-built liquid metal ion beam

2022 ◽  
Vol 131 (1) ◽  
pp. 014901
Author(s):  
Byeong Jun Cha ◽  
Woo Jun Byeon ◽  
Chang Min Choi ◽  
Boo Ki Min ◽  
Jinwan Cho ◽  
...  
Keyword(s):  
Surface Modification ◽  
Liquid Metal ◽  
Metal Ion ◽  
Ion Beam ◽  
Beam Surface

Ultra high vacuum compatible metal ion beam surface modification system

1990 ◽  
Vol 61 (11) ◽  
pp. 3412-3415
Author(s):  
Yuzo Mori ◽  
Hui Wang ◽  
Katsuyoshi Endo ◽  
Kazuto Yamauchi ◽  
Takashi Ide ◽  
...  
Keyword(s):  
Surface Modification ◽  
Metal Ion ◽  
Ion Beam ◽  
High Vacuum ◽  
Ultra High Vacuum ◽  
Modification System ◽  
Beam Surface

A Compact Nuclear Microprobe With a Liquid Metal Ion Source and a Toroidal Analyzer

1992 ◽  
Vol 295 ◽  
Author(s):  
Mikio Takai ◽  
Ryou Mimura ◽  
Hiroshi Sawaragi ◽  
Ryuso Aihara
Keyword(s):  
Liquid Metal ◽  
Metal Ion ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
High Vacuum ◽  
Spot Size ◽  
Ion Source ◽  
Ultra High Vacuum ◽  
Atomic Resolution ◽  
Nuclear Microprobe

AbstractA nondestructive three-dimensional RBS/channeling analysis system with an atomic resolution has been designed and is being constructed in Osaka University for analysis of nanostructured surfaces and interfaces. An ultra high-vacuum sample-chamber with a threeaxis goniometer and a toroidal electrostatic analyzer for medium energy ion scattering (MEIS) was combined with a short acceleration column for a focused ion beam. A liquid metal ion source (LMIS) for light metal ions such as Li+ or Be+ was mounted on the short column.A minimum beam spot-size of about 10 nm with a current of 10 pA is estimated by optical property calculation for 200 keV Li+ LMIS. An energy resolution of 4 × 10-3 (AE/E) for the toroidal analyzer gives rise to atomic resolution in RBS spectra for Si and GaAs. This system seems feasible for atomic level analysis of localized crystalline/disorder structures and surfaces.

Focussed Ion Beams from Liquid Metal Ion Sources Theory and Applications

1985 ◽  
Vol 45 ◽  
Author(s):  
David R Kingham ◽  
Vincent J Mifsud
Keyword(s):  
Liquid Metal ◽  
Metal Ion ◽  
Ion Beam ◽  
Ion Beams ◽  
Ion Source ◽  
Physical Reason ◽  
Probe Size ◽  
Focussed Ion Beam ◽  
Source Current ◽  
Manufacturing Techniques

ABSTRACTA theoretical model of liquid metal ion source (LMIS) operation has been developed by Kingham and Swanson. In this paper we consider beams from LMIS on the basis of this model. In particular we consider properties such as angular intensity, energy spread and relative abundance of differently charged species of the ion beam, and the dependence of these properties on source current and elemental composition. The conclusion is that the brightest focussed beam for a given probe size is attainable at the lowest possible source current as previously stated by Swanson. LMIS sources have an onset current of typically 1-2[A and will not operate stably below this current, thus limiting the maximum focussed ion beam brightness. The physical reason for this is discussed. The relevance of these properties to fine focussed ion beam applications, particularly semiconductor processing, is discussed. Useful, and in some cases unique, device manufacturing techniques can be postulated using one or more of the momentum, energy or atomic addition properties inherant tothis type of system. Advanced research tools are discussed, together with some examples of the use of microfocussed ion beams with probe sizes down to less than 50nm. Immediate applications include: high resolution ion imaging and SIMS microanalysis; ion beam machining and microfabrication; ion beam resist exposure and ion beam mask repair.

Long-life bismuth liquid metal ion source for focussed ion beam micromachining application

2008 ◽  
Vol 254 (22) ◽  
pp. 7401-7404 ◽  
Author(s):  
P. Mazarov ◽  
A. Melnikov ◽  
R. Wernhardt ◽  
A.D. Wieck
Keyword(s):  
Liquid Metal ◽  
Metal Ion ◽  
Ion Beam ◽  
Ion Source ◽  
Focussed Ion Beam ◽  
Long Life

Industrial applications of TOF-SIMS imaging

1996 ◽  
Vol 54 ◽  
pp. 1040-1041
Author(s):  
Steven J. Pachuta
Keyword(s):  
Liquid Metal ◽  
Metal Ion ◽  
Secondary Ion Mass Spectrometry ◽  
Ion Beam ◽  
Mass Range ◽  
Chemical Imaging ◽  
Industrial Applications ◽  
Beam Diameter ◽  
Tof Sims ◽  
Initial Penetration

Time-of-flight secondary ion mass spectrometry (TOF-SIMS) has in recent years become a useful tool for surface analysis in industrial laboratories. All elements and isotopes, as well as many molecular entities, can be detected by SIMS, with most of the signal coming from the outer 10 - 20 Å of the surface. The initial penetration of TOF-SIMS into industry was as an improvement over existing quadrupole instruments, with higher mass range, mass resolution, and sensitivity. The coupling of TOF-SIMS with high brightness liquid metal ion sources greatly expanded the applicability of the technique, making chemical imaging of the outermost monolayers of a surface a routine experiment.Several examples will be presented of TOF-SIMS imaging applied to real-world materials encountered in an industrial analytical laboratory. All results were obtained from a PHI-Evans TFS series instrument equipped with an FEI two-lens 69Ga+ liquid metal ion gun (LMIG). When operated at 25 keV beam energy, a primary ion beam diameter of 2500 Å in continuous mode, and 1-2 μm in pulsed mode, can routinely be obtained.

Effects of ion beam surface modification on proton conductivity of BaCe0.9Y0.1O3−δ

2008 ◽  
Vol 179 (21-26) ◽  
pp. 1182-1186 ◽  
Author(s):  
Jae-Hwan Kim ◽  
Bun Tsuchiya ◽  
Shinji Nagata ◽  
Tatsuo Shikama
Keyword(s):  
Surface Modification ◽  
Proton Conductivity ◽  
Ion Beam ◽  
Beam Surface
Sign in / Sign up

Export Citation Format

Share Document