Characterization of hollow cathode plasma turbulence using coherent Thomson scattering

2021 ◽  
Vol 130 (24) ◽  
pp. 243304
Author(s):  
S. Tsikata ◽  
K. Hara ◽  
S. Mazouffre
Keyword(s):  
Hollow Cathode ◽  
Plasma Turbulence ◽  
Thomson Scattering ◽  
Cathode Plasma

Optical and Electronic Characterization of a-SiGe:H Thin Films Prepared by a Novel Hollow Cathode Deposition Technique

2004 ◽  
Vol 808 ◽  
Author(s):  
R. J. Soukup ◽  
N. J. Ianno ◽  
Scott A. Darveau ◽  
Christopher L. Exstrom
Keyword(s):  
Thin Films ◽  
Hollow Cathode ◽  
Secondary Ion Mass Spectrometry ◽  
Dark Conductivity ◽  
Cathode Plasma ◽  
Glass Substrates ◽  
Elemental Analyses ◽  
Silicon And Germanium ◽  
Secondary Ion

ABSTRACTUsing a novel hollow cathode plasma-jet reactive sputtering system in which an intense plasma, ignited in an Ar/H2 flow, is directed through silicon and germanium nozzles, a series of a-SiGe:H thin films have been prepared on silicon and glass substrates. These films have been optically characterized by infrared (IR) spectroscopy and spectroscopic ellipsometry (335-1000nm). Total hydrogen concentrations, as determined by FTIR, varied with deposition conditions and ranged from 2.5 × 1021 to 1.6 × 1022 atom cm−3 and correlated with secondary ion mass spectrometry (SIMS) elemental analyses to within 10%. Conductivity measurements in the dark and under simulated AM1 solar illumination have indicated that the films properties are very good. The light to dark conductivity ratio has consistently been greater than 1000 for films with band gaps down to 1.3 eV.

Characterization of TiO film prepared by plasma enhanced chemical vapor deposition using a multi-jet hollow cathode plasma source

2001 ◽  
Vol 175-176 ◽  
pp. 697-702 ◽  
Author(s):  
Masatoshi Nakamura ◽  
Dariusz Korzec ◽  
Toru Aoki ◽  
Jurgen Engemann ◽  
Yoshinori Hatanaka
Keyword(s):  
Chemical Vapor Deposition ◽  
Hollow Cathode ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Plasma Source ◽  
Cathode Plasma

Development and characterization of micromachined hollow cathode plasma display devices

2002 ◽  
Vol 11 (5) ◽  
pp. 536-543 ◽  
Author(s):  
Jack Chen ◽  
Sung-Jin Park ◽  
Zhifang Fan ◽  
J.G. Eden ◽  
Chang Liu
Keyword(s):  
Hollow Cathode ◽  
Cathode Plasma ◽  
Display Devices ◽  
Plasma Display

Characterization of a Hollow Cathode Plasma with Magnetic Fields

2021 ◽  
Author(s):  
Daisuke Imaguchi ◽  
Hiroki Watanabe ◽  
Shun Imai ◽  
Ikkoh Funaki ◽  
Yoshiki Yamagiwa
Keyword(s):  
Magnetic Fields ◽  
Hollow Cathode ◽  
Cathode Plasma
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