scholarly journals Ultrafast laser interaction with transparent multi-layer SiO2/Si3N4 films

2021 ◽  
Vol 130 (24) ◽  
pp. 243105
Author(s):  
Ruben Ricca ◽  
Victor Boureau ◽  
Yves Bellouard
Keyword(s):  
Ultrafast Laser ◽  
Laser Interaction

Thermal and Thermomechanical Phenomena During Ultrafast Laser Interaction With Tissue

2000 ◽  
Author(s):  
Xinwei Wang ◽  
Xianfan Xu ◽  
Lisa X. Xu
Keyword(s):  
Laser Ablation ◽  
Pulsed Laser ◽  
Pulsed Laser Ablation ◽  
Dielectric Materials ◽  
Biological Tissues ◽  
Clinical Applications ◽  
Ultrafast Laser ◽  
Collateral Damage ◽  
Laser Interaction ◽  
Tissue Removal

Abstract Ultrafast (or ultrashort) pulsed laser ablation of biological tissue has drawn much attention due to the minimal collateral damage caused by laser irradiation. Many clinical applications of ultrafast laser ablation have been proposed, including ophthalmology, dentistry, and neurosurgery (Kim et al., 1998). During ultrafast laser interaction with biological tissues, which are dielectric materials, multiphonon absorption occurs which enhances the absorption of the laser beam in tissue. The tissue can then be heated rapidly to a high temperature, causing evaporation and tissue removal.

Ultrafast laser interaction with fused silica: from damage threshold to nanomachining

2013 ◽  
Author(s):  
M. Sentis ◽  
B. Chimier ◽  
M. Lebugle ◽  
N. Sanner ◽  
O. Utéza ◽  
...  
Keyword(s):  
Damage Threshold ◽  
Fused Silica ◽  
Ultrafast Laser ◽  
Laser Interaction

scholarly journals Thermal effects of ultrafast laser interaction with polypropylene

2019 ◽  
Vol 27 (4) ◽  
pp. 5764 ◽  
Author(s):  
Arifur Rahaman ◽  
Aravinda Kar ◽  
Xiaoming Yu
Keyword(s):  
Thermal Effects ◽  
Ultrafast Laser ◽  
Laser Interaction

Ultrafast Laser Interaction Processes for Libs and Other Sensing Technologies

2013 ◽  
Author(s):  
Martin Richardson ◽  
Michael Sigman ◽  
Matthieu Baudelet ◽  
Candice Bridge ◽  
Santiago Palanco ◽  
...  
Keyword(s):  
Ultrafast Laser ◽  
Laser Interaction ◽  
Interaction Processes

The Role of Thermal Excitation of D Band Electrons in Ultrafast Laser Interaction With Noble (Cu) and Transition (Pt) Metals

2007 ◽  
Author(s):  
Zhibin Lin ◽  
Leonid V. Zhigilei
Keyword(s):  
Heat Capacity ◽  
Coupling Factor ◽  
Ultrafast Laser ◽  
Thermal Excitation ◽  
Phonon Coupling ◽  
Laser Interaction ◽  
Electron Heat Capacity ◽  
Electron Heat ◽  
Electron Phonon Coupling ◽  
Temperature Dependences

The temperature dependences of the electron heat capacity and electron-phonon coupling factor for noble (Cu) and transition (Pt) metals are investigated based on the electron density of states (DOS) obtained from ab initio electronic structure calculations. For Cu, d band electrons could be thermally excited when the electron temperature exceeds ∼3000 K, leading to a significant increase, up to an order of magnitude, in the electron-phonon coupling factor and strong enhancement of the electron heat capacity away from the linear dependence on the electron temperature, which is commonly used in most of the current computational and theoretical investigations of ultrafast laser interactions with metals. Opposite to the case in Cu, the thermal excitation of d band electrons in Pt leads to a monotonic decrease of the electron-phonon coupling factor and contributes to significant negative deviations of the electron heat capacity from the linear dependence in the range of electron temperatures that are typically realized in ultrafast laser material processing applications. Strong and drastically different temperature dependences of the thermophysical properties predicted for Cu and Pt point to the importance of the electron DOS effects and the necessity of full consideration of thermal excitation of d band electrons for realistic modeling of short pulse laser interaction with noble and transition metals.

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