Defect-free interface between amorphous (Al2O3)1−x(SiO2)x and GaN(0001) revealed by first-principles simulated annealing technique
1994 ◽
Vol 52
(S28)
◽
pp. 541-551
◽
Keyword(s):
2010 ◽
Vol 485
(1-3)
◽
pp. 26-30
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Keyword(s):
2003 ◽
Vol 17
(03)
◽
pp. 273-279
Keyword(s):