Study of formation mechanism of double metal plasma jets in a low-current pulsed vacuum arc discharge

2021 ◽  
Vol 33 (3) ◽  
pp. 037103
Author(s):  
Jia Tian ◽  
Wenzheng Liu ◽  
Wenjun Zhang ◽  
Xitao Jiang
Keyword(s):  
Formation Mechanism ◽  
Arc Discharge ◽  
Plasma Jets ◽  
Vacuum Arc ◽  
Metal Plasma

Study of ion separation mechanism in the multi-component vacuum arc discharge

2021 ◽  
Author(s):  
Qiang Sun ◽  
Qianhong Zhou ◽  
Hantian Zhang ◽  
Wei Yang ◽  
Ye Dong ◽  
...  
Keyword(s):  
Heavy Ions ◽  
Cathode Spot ◽  
Arc Discharge ◽  
Fluid Model ◽  
Composite Cathode ◽  
Plasma Jets ◽  
Vacuum Arc ◽  
Separation Mechanism ◽  
Ion Separation ◽  
Light Ions

Abstract The separation phenomenon of light and heavy ions was widely observed experimentally in the vacuum arc discharge with multi-component composite cathode. In this work, a two-dimensional axisymmetric multi-fluid model is used to study the separation mechanism in the multi-component composite cathode vacuum arc. The multi-component vacuum arcs are simulated as a whole which includes separate cathode spot jets, the mixing region, and common arc column. The results show that the plasma jets originated from the separate cathode spot mix together to form a common arc column after a certain distance from the cathode. Due to the rapid increase of ion temperature dozens of times in mixing region of cathode spot jet, the effect of pressure gradient becomes far greater than that of the collisions between light and heavy ions. This leads to a shift in the predominant ion motion mechanism from ion-ion collision (single cathode spot jet region) to pressure expansion (the mixing region). Finally, the light ions gain higher velocities under pressure expansion. In addition, the effect of thermal conductivity and viscosity leads to the wider high temperature regions for light ions, thus making a wider distribution of corresponding ion flux. The numerical results are qualitatively consistent with the experimental results. This paper provides an insight into ion separation mechanism in the multi-component vacuum arc.

Influence of Thermal Cathode Mode on Properties of Coatings Deposited from Metal Plasma of Vacuum-Arc Discharge

2002 ◽  
Vol 10 (3) ◽  
pp. 179-186 ◽  
Author(s):  
V. G. Kuznezov ◽  
A. A. Lisenkov ◽  
V. A. Pavlova ◽  
N. Z. Vetrov
Keyword(s):  
Arc Discharge ◽  
Vacuum Arc ◽  
Properties Of Coatings ◽  
Metal Plasma ◽  
Thermal Cathode

scholarly journals Formation of coatings from the flow of metal plasma of a vacuum-arc discharge

2018 ◽  
Vol 387 ◽  
pp. 012066
Author(s):  
A A Rikov ◽  
M I Yurchenkov ◽  
A A Lisenkov ◽  
D K Kostrin
Keyword(s):  
Arc Discharge ◽  
Vacuum Arc ◽  
Metal Plasma

scholarly journals Thickness measurements of coatings formed from metal plasma of a vacuum arc discharge using X-ray radiation

2017 ◽  
Vol 808 ◽  
pp. 012005 ◽  
Author(s):  
A A Lisenkov ◽  
S A Martsinukov ◽  
V V Chernigovskiy ◽  
D K Kostrin ◽  
E A Smirnov
Keyword(s):  
Arc Discharge ◽  
Vacuum Arc ◽  
X Ray ◽  
Metal Plasma ◽  
Thickness Measurements

New Developments in Metal Ion Implantation by Vacuum Arc Ion Sources and Metal Plasma Immersion

1995 ◽  
Vol 396 ◽  
Author(s):  
I.G. Brown ◽  
A. Anders ◽  
S. Anders ◽  
M.R. Dickinson ◽  
R.A. MacGill ◽  
...  
Keyword(s):  
Surface Modification ◽  
Ion Implantation ◽  
Metal Ion ◽  
Arc Discharge ◽  
High Energy ◽  
Ion Source ◽  
Plasma Sheath ◽  
Vacuum Arc ◽  
Large Area ◽  
Metal Plasma

AbstractIon implantation by intense beams of metal ions can be accomplished using the dense metal plasma formed in a vacuum arc discharge embodied either in a vacuum arc ion source or in a ‘metal plasma immersion’ configuration. In the former case high energy metal ion beams are formed and implantation is done in a more-or-less conventional way, and in the latter case the substrate is immersed in the plasma and repetitively pulse-biased so as to accelerate the ions at the high voltage plasma sheath formed at the substrate. A number of advances have been made in the last few years, both in plasma technology and in the surface modification procedures, that enhance the effectiveness and versatility of the methods, including for example: controlled increase of the ion charge states produced; operation in a dual metal-gaseous ion species mode; very large area beam formation; macroparticle filtering; and the development of processing regimes for optimizing adhesion, morphology and structure. These complementary ion processing techniques provide the plasma tools for doing ion surface modification over a very wide parameter regime, from ‘pure’ ion implantation at energies approaching the MeV level, through ion mixing at energies in the ∼1 to ∼100 keV range, to IBAD-like processing at energies from a few tens of eV to a few keV. Here we review the methods, describe a number of recent developments, and outline some of the surface modification applications to which the methods have been put.

Radiographic research of the metal-puff plasma jets formed by the vacuum arc discharge

2017 ◽  
Author(s):  
A. G. Rousskikh ◽  
A. P. Artyomov ◽  
A. S. Zhigalin ◽  
A. V. Fedunin ◽  
V. I. Oreshkin ◽  
...  
Keyword(s):  
Arc Discharge ◽  
Plasma Jets ◽  
Vacuum Arc

Synthesis of Transition Metals Carbide Compounds in the Vacuum Arc Discharge Plasma

2016 ◽  
Vol 870 ◽  
pp. 371-376 ◽  
Author(s):  
D.K. Kostrin ◽  
A.A. Lisenkov
Keyword(s):  
Transition Metals ◽  
Discharge Plasma ◽  
Arc Discharge ◽  
Vacuum Arc ◽  
Composition Analysis ◽  
Plasma Flux ◽  
Carbide Phases ◽  
Metal Plasma ◽  
Spectral Analyzer

To implement the plasmochemical synthesis of transition metals (Ti, Zr, Mo, W) carbide compounds in a plasma flux of the vacuum arc the discharge carbonaceous working gas is infused. It is shown that the composition of the initial carbonaceous gas defines both the carbon output, and the nature and course of the carbide compounds formation chemical reaction. The composition analysis of the plasma flux in the course of the coating evaporation was carried out by means of the developed emissive spectral analyzer. The result shows that a considerable part of transition metals carbide phases has wide zones of homogeneity within which the change in the carbon content happens without the crystalline grid reorganization. The work reveals and analyzes the factors defining quality of the received carbide compounds (TiC, ZrC, MoC, WC) of refractory metals in a flux of metal plasma of the vacuum arc discharge.

Preparation and characterization of thin films of carbon nitride

1995 ◽  
Vol 53 ◽  
pp. 104-105
Author(s):  
L. Wan ◽  
R. F. Egerton
Keyword(s):  
Carbon Nitride ◽  
Arc Discharge ◽  
Ion Beam ◽  
Chemical Vapor ◽  
Reactive Sputtering ◽  
Vacuum Arc ◽  
Specimen Preparation ◽  
Bonding Structure ◽  
Electron Energy Loss

INTRODUCTION Recently, a new compound carbon nitride (CNx) has captured the attention of materials scientists, resulting from the prediction of a metastable crystal structure β-C3N4. Calculations showed that the mechanical properties of β-C3N4 are close to those of diamond. Various methods, including high pressure synthesis, ion beam deposition, chemical vapor deposition, plasma enhanced evaporation, and reactive sputtering, have been used in an attempt to make this compound. In this paper, we present the results of electron energy loss spectroscopy (EELS) analysis of composition and bonding structure of CNX films deposited by two different methods.SPECIMEN PREPARATION Specimens were prepared by arc-discharge evaporation and reactive sputtering. The apparatus for evaporation is similar to the traditional setup of vacuum arc-discharge evaporation, but working in a 0.05 torr ambient of nitrogen or ammonia. A bias was applied between the carbon source and the substrate in order to generate more ions and electrons and change their energy. During deposition, this bias causes a secondary discharge between the source and the substrate.

Plasma-assisted deposition of indium tin oxide thin films by sublimation using an anodic vacuum arc discharge

2021 ◽  
pp. 138731
Author(s):  
Bert Scheffel ◽  
Olaf Zywitzki ◽  
Thomas Preußner ◽  
Torsten Kopte
Keyword(s):  
Thin Films ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Arc Discharge ◽  
Vacuum Arc ◽  
Oxide Thin Films
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