Fabrication of 20 nm period multilayer metal-dielectric structures and initial patterning tests

2020 ◽  
Author(s):  
Radu Malureanu ◽  
Johneph Sukham ◽  
Sezer Köse ◽  
Osamu Takayama ◽  
Andrei Lavrinenko
Keyword(s):  
20 Nm ◽  
Dielectric Structures ◽  
Multilayer Metal

Cylindrical multilayer metal–dielectric structures

2015 ◽  
Vol 41 (11) ◽  
pp. 1097-1098 ◽  
Author(s):  
M. E. Sasin ◽  
N. D. Il’inskaya ◽  
Yu. M. Zadiranov ◽  
N. A. Kaliteevskaya ◽  
A. A. Lazarenko ◽  
...  
Keyword(s):  
Dielectric Structures ◽  
Multilayer Metal

Imaging and Analytical Challenges for Nanoscale Semiconductor Technology: Breakthrough Needs for Development and Manufacturing

1997 ◽  
Vol 3 (S2) ◽  
pp. 449-450
Author(s):  
Robert C. McDonald ◽  
A. John Mardinly ◽  
David W. Susnitzky
Keyword(s):  
Process Development ◽  
Semiconductor Industry ◽  
Large Fraction ◽  
Measurement Tool ◽  
Technology Roadmap ◽  
Transmission Electron ◽  
New Process ◽  
Dielectric Structures ◽  
Multilayer Metal ◽  
Si Wafer

The complexity of today’s commercial semiconductors has contributed to tremendous gains in device performance; millions of transistors are now packed into each square centimeter of silicon. The reduction of scale occurring within the semiconductor industry places extraordinary new demands on transmission electron microscopy: TEM is becoming a required precision measurement tool for manufacturing and a necessary analytical tool for R&D and failure analysis support. This paper reviews the industry’s needs for advanced TEM sample preparation, imaging and microanalysis and outlines the challenges presented to the TEM community as device dimensions continue along the National Technology Roadmap.In the semiconductor industry, TEM is applied to process debugging, yield engineering, tool qualifications, single-bit failure analyses, and new process development. A large fraction of the analysis effort focuses on transistor, metal, interconnect and dielectric structures grown on and into the Si wafer. Fig. 1 shows a TEM image of a multilayer metal in a near-current generation microprocessor to illustrate the scale and nature of complexity.

Macromolecular structures of biological specimens are not obscured by controlled osmium impregnation

1983 ◽  
Vol 41 ◽  
pp. 606-607
Author(s):  
Klaus-Ruediger Peters ◽  
Samuel A. Green
Keyword(s):  
Thin Films ◽  
Electrical Conductivity ◽  
Critical Point ◽  
Metal Films ◽  
High Magnification ◽  
Osmium Impregnation ◽  
Instrumental Resolution ◽  
20 Nm ◽  
Continuous Metal

High magnification imaging of macromolecules on metal coated biological specimens is limited only by wet preparation procedures since recently obtained instrumental resolution allows visualization of topographic structures as smal l as 1-2 nm. Details of such dimensions may be visualized if continuous metal films with a thickness of 2 nm or less are applied. Such thin films give sufficient contrast in TEM as well as in SEM (SE-I image mode). The requisite increase in electrical conductivity for SEM of biological specimens is achieved through the use of ligand mediated wet osmiuum impregnation of the specimen before critical point (CP) drying. A commonly used ligand is thiocarbohvdrazide (TCH), first introduced to TEM for en block staining of lipids and glvcomacromolecules with osmium black. Now TCH is also used for SEM. However, after ligand mediated osinification nonspecific osmium black precipitates were often found obscuring surface details with large diffuse aggregates or with dense particular deposits, 2-20 nm in size. Thus, only low magnification work was considered possible after TCH appl ication.

A scanning electron microscopic study of the veliger larvae of the scallop argopecten purpuratus

1988 ◽  
Vol 46 ◽  
pp. 284-285
Author(s):  
G.C. Bellolio ◽  
K.S. Lohrmann ◽  
E.M. Dupré
Keyword(s):  
Morphological Description ◽  
Electron Microscopic ◽  
Larval Stages ◽  
Scanning Electron Microscopic Study ◽  
The Pacific ◽  
Argopecten Purpuratus ◽  
Veliger Larvae ◽  
20 Nm ◽  
Ethanol Series ◽  
Scanning Electron

Argopecten purpuratus is a scallop distributed in the Pacific coast of Chile and Peru. Although this species is mass cultured in both countries there is no morphological description available of the development of this bivalve except for few characterizations of some larval stages described for culture purposes. In this work veliger larvae (app. 140 pm length) were examined by the scanning electron microscope (SEM) in order to study some aspects of the organogenesis of this species.Veliger larvae were obtained from hatchery cultures, relaxed with a solution of MgCl2 and killed by slow addition of 21 glutaraldehyde (GA) in seawater (SW). They were fixed in 2% GA in calcium free artificial SW (pH 8.3), rinsed 3 times in calcium free SW, and dehydrated in a graded ethanol series. The larvae were critical point dried and mounted on double scotch tape (DST). To permit internal view, some valves were removed by slightly pressing and lifting the tip of a cactus spine wrapped with DST, The samples were coated with 20 nm gold and examined with a JEOL JSM T-300 operated at 15 KV.

Analysis of 2D and 3D defects associated with precipitation of Cu in silicon

1991 ◽  
Vol 49 ◽  
pp. 870-871
Author(s):  
P.M. Rice ◽  
MJ. Kim ◽  
R.W. Carpenter
Keyword(s):  
Colony Growth ◽  
Dark Field ◽  
Dark Side ◽  
Silicide Phase ◽  
Strain Fields ◽  
Near Surface ◽  
Unknown Composition ◽  
Secondary Precipitates ◽  
20 Nm ◽  
2D And 3D

Extrinsic gettering of Cu on near-surface dislocations in Si has been the topic of recent investigation. It was shown that the Cu precipitated hetergeneously on dislocations as Cu silicide along with voids, and also with a secondary planar precipitate of unknown composition. Here we report the results of investigations of the sense of the strain fields about the large (~100 nm) silicide precipitates, and further analysis of the small (~10-20 nm) planar precipitates.Numerous dark field images were analyzed in accordance with Ashby and Brown's criteria for determining the sense of the strain fields about precipitates. While the situation is complicated by the presence of dislocations and secondary precipitates, micrographs like those shown in Fig. 1(a) and 1(b) tend to show anomalously wide strain fields with the dark side on the side of negative g, indicating the strain fields about the silicide precipitates are vacancy in nature. This is in conflict with information reported on the η'' phase (the Cu silicide phase presumed to precipitate within the bulk) whose interstitial strain field is considered responsible for the interstitial Si atoms which cause the bounding dislocation to expand during star colony growth.

Aspects of high-resolution imaging with a scanning ion microprobe

1986 ◽  
Vol 44 ◽  
pp. 750-751
Author(s):  
R. Levi-Setti ◽  
J. M. Chabala ◽  
Y. L. Wang
Keyword(s):  
Metal Ion ◽  
Secondary Ion Mass Spectrometry ◽  
Chromatic Aberration ◽  
Ion Source ◽  
Ion Microprobe ◽  
Emission Pattern ◽  
Intrinsic Resolution ◽  
Resolution Imaging ◽  
20 Nm ◽  
Secondary Ion

We have shown the feasibility of 20 nm lateral resolution in both topographic and elemental imaging using probes of this size from a liquid metal ion source (LMIS) scanning ion microprobe (SIM). This performance, which approaches the intrinsic resolution limits of secondary ion mass spectrometry (SIMS), was attained by limiting the size of the beam defining aperture (5μm) to subtend a semiangle at the source of 0.16 mr. The ensuing probe current, in our chromatic-aberration limited optical system, was 1.6 pA with Ga+ or In+ sources. Although unique applications of such low current probes have been demonstrated,) the stringent alignment requirements which they imposed made their routine use impractical. For instance, the occasional tendency of the LMIS to shift its emission pattern caused severe misalignment problems.

Ultramicrotomy as a Technique for Materials Specimen Preparation

1990 ◽  
Vol 48 (2) ◽  
pp. 428-429
Author(s):  
S.R. Glanvill
Keyword(s):  
Materials Science ◽  
Structural Information ◽  
Specimen Preparation ◽  
Preparation Technique ◽  
Cross Sectional ◽  
Surfaces And Interfaces ◽  
Beam Analysis ◽  
Flat Embedding ◽  
20 Nm ◽  
Sectional Analysis

This paper summarizes the application of ultramicrotomy as a specimen preparation technique for some of the Materials Science applications encountered over the past two years. Specimens 20 nm thick by hundreds of μm lateral dimension are readily prepared for electron beam analysis. Materials examined include metals, plastics, ceramics, superconductors, glassy carbons and semiconductors. We have obtain chemical and structural information from these materials using HRTEM, CBED, EDX and EELS analysis. This technique has enabled cross-sectional analysis of surfaces and interfaces of engineering materials and solid state electronic devices, as well as interdiffusion studies across adjacent layers.Samples are embedded in flat embedding moulds with Epon 812 epoxy resin / Methyl Nadic Anhydride mixture, using DY064 accelerator to promote the reaction. The embedded material is vacuum processed to remove trapped air bubbles, thereby improving the strength and sectioning qualities of the cured block. The resin mixture is cured at 60 °C for a period of 80 hr and left to equilibrate at room temperature.

The brain structure and neurosecretory cells of noctuid moth Anadevidia peponis: Noctuidae

1990 ◽  
Vol 48 (3) ◽  
pp. 436-437
Author(s):  
M. Sato ◽  
Y. Ogawa ◽  
M. Sasaki ◽  
T. Matsuo
Keyword(s):  
Biological Clock ◽  
Virgin Female ◽  
Basic Structure ◽  
Fixed Time ◽  
Neurosecretory Cells ◽  
Nerve Cells ◽  
Noctuid Moth ◽  
The Right ◽  
20 Nm ◽  
The Brain

A virgin female of the noctuid moth, a kind of noctuidae that eats cucumis, etc. performs calling at a fixed time of each day, depending on the length of a day. The photoreceptors that induce this calling are located around the neurosecretory cells (NSC) in the central portion of the protocerebrum. Besides, it is considered that the female’s biological clock is located also in the cerebral lobe. In order to elucidate the calling and the function of the biological clock, it is necessary to clarify the basic structure of the brain. The observation results of 12 or 30 day-old noctuid moths showed that their brains are basically composed of an outer and an inner portion-neural lamella (about 2.5 μm) of collagen fibril and perineurium cells. Furthermore, nerve cells surround the cerebral lobes, in which NSCs, mushroom bodies, and central nerve cells, etc. are observed. The NSCs are large-sized (20 to 30 μm dia.) cells, which are located in the pons intercerebralis of the head section and at the rear of the mushroom body (two each on the right and left). Furthermore, the cells were classified into two types: one having many free ribosoms 15 to 20 nm in dia. and the other having granules 150 to 350 nm in dia. (Fig. 1).

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