Similarity law and frequency scaling in low-pressure capacitive radio frequency plasmas

2020 ◽  
Vol 117 (20) ◽  
pp. 204101
Author(s):  
Yangyang Fu ◽  
Bocong Zheng ◽  
De-Qi Wen ◽  
Peng Zhang ◽  
Qi Hua Fan ◽  
...  
Keyword(s):  
Radio Frequency ◽  
Low Pressure ◽  
Frequency Scaling ◽  
Similarity Law

Increasing the capillary of fiberglass under the application of a relief coating in the low-pressure radio-frequency induction discharge

2019 ◽  
Vol 1328 ◽  
pp. 012069
Author(s):  
E A Skidchenko ◽  
E F Voznesensky ◽  
V A Sysoev ◽  
G G Lutfullina ◽  
A E Karnouhov ◽  
...  
Keyword(s):  
Radio Frequency ◽  
Low Pressure ◽  
Induction Discharge

Experimental Investigation on Electromagnetic Attenuation by Low Pressure Radio-Frequency Plasma for Cavity Structure

2016 ◽  
Vol 18 (1) ◽  
pp. 62-66 ◽  
Author(s):  
Xiang He ◽  
Yachun Zhang ◽  
Jianping Chen ◽  
Yudong Chen ◽  
Xiaojun Zeng ◽  
...  
Keyword(s):  
Experimental Investigation ◽  
Radio Frequency ◽  
Low Pressure ◽  
Radio Frequency Plasma ◽  
Frequency Plasma ◽  
Cavity Structure

scholarly journals Self-excited instability occurring during the nanoparticle formation in an Ar–SiH4 low pressure radio frequency plasma

2006 ◽  
Vol 99 (6) ◽  
pp. 064301 ◽  
Author(s):  
M. Cavarroc ◽  
M. C. Jouanny ◽  
K. Radouane ◽  
M. Mikikian ◽  
L. Boufendi
Keyword(s):  
Radio Frequency ◽  
Low Pressure ◽  
Radio Frequency Plasma ◽  
Nanoparticle Formation ◽  
Frequency Plasma

scholarly journals Uses of radio emission spectroscopy for non-contact and in situ diagnostics of low pressure radio frequency plasma processing

2021 ◽  
Author(s):  
Rajani K. Vijayaraghavan ◽  
Sean Kelly ◽  
David Coates ◽  
Cezar Gaman ◽  
Niall MacGearailt ◽  
...  
Keyword(s):  
Radio Emission ◽  
Radio Frequency ◽  
Emission Spectroscopy ◽  
Near Field ◽  
Plasma Processing ◽  
Diagnostic Technique ◽  
Primary Source ◽  
Low Pressure ◽  
Chamber Pressure ◽  
Rf Plasma

Abstract We demonstrate that a passive non-contact diagnostic technique, radio emission spectroscopy (RES), provides a sensitive monitor of currents in a low pressure radio frequency (RF) plasma. A near field magnetic loop antenna was used to capture RF emissions from the plasma without perturbing it. The analysis was implemented for a capacitively coupled RF plasma with an RF supply at a frequency of 13.56 MHz. Real-time measurements are captured in scenarios relevant to contemporary challenges faced during semiconductor fabrication (e.g. window coating and wall disturbance). Exploration of the technique for key equipment parameters including applied RF power, chamber pressure, RF bias frequencies and chamber wall cleanliness shows sensitive and repeatable function. In particular, the induced RES signal was found to vary sensitively to pressure changes and we were able to detect pressure and power variations as low as ~2.5 %/mtorr and ~3.5 %/watt, respectively, during the plasma processing during a trial generic plasma process. Finally, we explored the ability of RES to monitor the operation of a multiple frequency low-pressure RF plasma system (f1 = 2 MHz, f2 = 162 MHz) and intermixing products which suggests strongly that the plasma sheaths are the primary source of this non-linear diode mixing effect.

scholarly journals MATHEMATICAL MODEL OF THE INTERACTION OF LOW-ENERGY INERT GAS IONS WITH POLYPROPYLENE IN RADIO-FREQUENCY PLASMA OF LOW PRESSURE

2021 ◽  
Vol 53 (3) ◽  
pp. 18-23
Author(s):  
Yulia A. Timoshina ◽  
Emil F. Voznesensky ◽  
Victor S. Zheltukhin
Keyword(s):  
Radio Frequency ◽  
Argon Atom ◽  
Argon Plasma ◽  
Low Pressure ◽  
Low Energy ◽  
Fibrous Materials ◽  
Frequency Plasma ◽  
Argon Ion Bombardment ◽  
Low Energy Ions ◽  
Argon Ion

Results of the molecular dynamic simulation of the interaction of low-energy ions (from 10 to 100 eV) with the surface of polypropylene fibrous materials in low pressure radio-frequency (RF) argon plasma is presented. A full-atomic model using the LAMMPS classical molecular dynamics code was made. As a result of numerical calculations, it was found that argon ion bombardment initiates the breaking both of an intermolecular and intramolecular bond of polypropylene with sputtered particles being the hydrocarbon radicals and single atoms. The depth of implantation of the ion is determined, the change in the kinetic energy of the argon atom and the temperature of the simulated cell is obtained.

Influence of Forbidden Processes on Similarity Law in Argon Glow Discharge at Low Pressure

2014 ◽  
Vol 31 (7) ◽  
pp. 075201 ◽  
Author(s):  
Yang-Yang Fu ◽  
Hai-Yun Luo ◽  
Xiao-Bing Zou ◽  
Xin-Xin Wang
Keyword(s):  
Glow Discharge ◽  
Low Pressure ◽  
Similarity Law
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