Ultra-thin Hf0.5Zr0.5O2 thin-film-based ferroelectric tunnel junction via stress induced crystallization
2000 ◽
Vol 14
(11)
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pp. 1405-1421
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1990 ◽
Vol 165-166
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pp. 103-104
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1976 ◽
Vol 14
(10)
◽
pp. 1827-1837
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