Mapping solution loss-tangent dependent deposition rate of MnZn-ferrite via microwave-assisted solvothermal processing

2020 ◽  
Author(s):  
Charu Singh ◽  
Ranajit Sai ◽  
R. D. Raland ◽  
S. A. Shivashankar ◽  
Piyush Jaiswal
Author(s):  
T.E. Pratt ◽  
R.W. Vook

(111) oriented thin monocrystalline Ni films have been prepared by vacuum evaporation and examined by transmission electron microscopy and electron diffraction. In high vacuum, at room temperature, a layer of NaCl was first evaporated onto a freshly air-cleaved muscovite substrate clamped to a copper block with attached heater and thermocouple. Then, at various substrate temperatures, with other parameters held within a narrow range, Ni was evaporated from a tungsten filament. It had been shown previously that similar procedures would yield monocrystalline films of CU, Ag, and Au.For the films examined with respect to temperature dependent effects, typical deposition parameters were: Ni film thickness, 500-800 A; Ni deposition rate, 10 A/sec.; residual pressure, 10-6 torr; NaCl film thickness, 250 A; and NaCl deposition rate, 10 A/sec. Some additional evaporations involved higher deposition rates and lower film thicknesses.Monocrystalline films were obtained with substrate temperatures above 500° C. Below 450° C, the films were polycrystalline with a strong (111) preferred orientation.


Author(s):  
R. W. Vook ◽  
R. Cook ◽  
R. Ziemer

During recent experiments on Au films, a qualitative correlation between hole formation and deposition rate was observed. These early studies were concerned with films 80 to 1000A thick deposited on glass at -185°C and annealed at 170°C. In the present studies this earlier work was made quantitative. Deposition rates varying between 5 and 700 A/min were used. The effects of deposition rate on hole density for two films 300 and 700A thick were investigated.Au was evaporated from an outgassed W filament located 10 cm from a glass microscope slide substrate and a quartz crystal film thickness monitor. A shutter separating the filament from the substrate and monitor made it possible to obtain a constant evaporation rate before initiating deposition. The pressure was reduced to less than 1 x 10-6 torr prior to cooling the substrate with liquid nitrogen. The substrate was cooled in 15 minutes during which the pressure continued to drop to the mid 10-7 torr range, where deposition was begun.


Planta Medica ◽  
2009 ◽  
Vol 75 (09) ◽  
Author(s):  
I Stanisavljević ◽  
M Lazić ◽  
N Radulović ◽  
V Veljković

2015 ◽  
Author(s):  
Corinne Fruit ◽  
Julien Godeau ◽  
Marine Harari ◽  
Sylvain Laclef ◽  
Vincent Levacher ◽  
...  

Author(s):  
Marcin Lukasiewicz ◽  
Anna Osowiec ◽  
Magdalena Marciniak

Sign in / Sign up

Export Citation Format

Share Document