scholarly journals Commissioning experiment of the high-contrast SILEX-Ⅱ multi-petawatt laser facility

2021 ◽  
Vol 6 (6) ◽  
pp. 064401
Author(s):  
Wei Hong ◽  
Shukai He ◽  
Jian Teng ◽  
Zhigang Deng ◽  
Zhimeng Zhang ◽  
...  
Keyword(s):  
High Contrast ◽  
Laser Facility

High contrast high intensity petawatt J-KAREN-P laser facility at QST

2017 ◽  
Author(s):  
Mamiko Nishiuchi ◽  
Hiromitsu Kiriyama ◽  
Hironao Sakaki ◽  
Nicholas P. Dover ◽  
Kotaro Kondo ◽  
...  
Keyword(s):  
High Intensity ◽  
High Contrast ◽  
Laser Facility

Atomic physics of relativistic high contrast laser-produced plasmas in experiments on Leopard laser facility at UNR

2012 ◽  
Vol 8 (2) ◽  
pp. 190-195 ◽  
Author(s):  
A.S. Safronova ◽  
V.L. Kantsyrev ◽  
A.Y. Faenov ◽  
U.I. Safronova ◽  
P. Wiewior ◽  
...  
Keyword(s):  
Atomic Physics ◽  
High Contrast ◽  
Laser Facility

scholarly journals Route to High Contrast and Focusable Intensity in PW-Class Femtosecond Ti:sapphire Laser Facility

2010 ◽  
Vol 38 (9) ◽  
pp. 685-688
Author(s):  
Cheng LIU ◽  
Zhaohua WANG ◽  
Feng LIU ◽  
Weichang LI ◽  
Zhiyi WEI
Keyword(s):  
High Contrast ◽  
Ti:Sapphire Laser ◽  
Laser Facility

High contrast multi-terawatt pulse generation using chirped pulse amplification on the VULCAN laser facility

1993 ◽  
Vol 103 (5-6) ◽  
pp. 392-397 ◽  
Author(s):  
C.N. Danson ◽  
L.J. Barzanti ◽  
Z. Chang ◽  
A.E. Damerell ◽  
C.B. Edwards ◽  
...  
Keyword(s):  
Pulse Generation ◽  
High Contrast ◽  
Chirped Pulse ◽  
Pulse Amplification ◽  
Laser Facility ◽  
Chirped Pulse Amplification

scholarly journals A compact 355TW femtosecod Ti:sapphire laser facility and trend to high contrast ratio

2008 ◽  
Vol 112 (3) ◽  
pp. 032003 ◽  
Author(s):  
Z Y Wei ◽  
Z H Wang ◽  
P Wang ◽  
W J Ling ◽  
J F Zhu ◽  
...  
Keyword(s):  
Contrast Ratio ◽  
High Contrast ◽  
Ti:Sapphire Laser ◽  
Laser Facility

scholarly journals High-contrast OPCPA front end in high-power petawatt laser facility based on the ps-OPCPA seed system

2021 ◽  
Author(s):  
Qi Xiao ◽  
Xue Pan ◽  
Youen Jiang ◽  
Jiangfeng Wang ◽  
Lifeng Du ◽  
...  
Keyword(s):  
High Power ◽  
High Contrast ◽  
Front End ◽  
Laser Facility ◽  
Seed System

Resistance Monitor and Control for Vacuum Evaporation of Metals and Carbon

1976 ◽  
Vol 34 ◽  
pp. 572-573
Author(s):  
Russell L. Steere ◽  
Eric F. Erbe ◽  
J. Michael Moseley
Keyword(s):  
Electronic Device ◽  
Point Sources ◽  
High Contrast ◽  
Variable Resistor ◽  
Quality Of Results ◽  
Low Contrast ◽  
Evaporation Source ◽  
And Control ◽  
At Will

We have designed and built an electronic device which compares the resistance of a defined area of vacuum evaporated material with a variable resistor. When the two resistances are matched, the device automatically disconnects the primary side of the substrate transformer and stops further evaporation.This approach to controlled evaporation in conjunction with the modified guns and evaporation source permits reliably reproducible multiple Pt shadow films from a single Pt wrapped carbon point source. The reproducibility from consecutive C point sources is also reliable. Furthermore, the device we have developed permits us to select a predetermined resistance so that low contrast high-resolution shadows, heavy high contrast shadows, or any grade in between can be selected at will. The reproducibility and quality of results are demonstrated in Figures 1-4 which represent evaporations at various settings of the variable resistor.

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