Zero temperature coefficient of resistance in back-end-of-the-line compatible titanium aluminum nitride films by atomic layer deposition

2020 ◽  
Vol 117 (4) ◽  
pp. 041902 ◽  
Author(s):  
Igor Krylov ◽  
Yuanshen Qi ◽  
Valentina Korchnoy ◽  
Kamira Weinfeld ◽  
Moshe Eizenberg ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Aluminum Nitride ◽  
Temperature Coefficient ◽  
Atomic Layer ◽  
Zero Temperature ◽  
Temperature Coefficient Of Resistance ◽  
Layer Deposition ◽  
Titanium Aluminum ◽  
Titanium Aluminum Nitride

Atomic Layer Deposition of Aluminum Nitride and Oxynitride on Silicon Using Tris(dimethylamido)aluminum, Ammonia, and Water

2018 ◽  
Vol 88 (8) ◽  
pp. 1699-1706 ◽  
Author(s):  
A. I. Abdulagatov ◽  
R. R. Amashaev ◽  
Kr. N. Ashurbekova ◽  
K. N. Ashurbekova ◽  
M. Kh. Rabadanov ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Aluminum Nitride ◽  
Atomic Layer ◽  
Layer Deposition

Atomic Layer Deposition of Aluminum Nitride Using Tris(diethylamido)aluminum and Hydrazine or Ammonia

2018 ◽  
Vol 47 (2) ◽  
pp. 118-130 ◽  
Author(s):  
A. I. Abdulagatov ◽  
Sh. M. Ramazanov ◽  
R. S. Dallaev ◽  
E. K. Murliev ◽  
D. K. Palchaev ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Aluminum Nitride ◽  
Atomic Layer ◽  
Layer Deposition

scholarly journals Direct plasma-enhanced atomic layer deposition of aluminum nitride for water permeation barriers

2020 ◽  
Vol 38 (2) ◽  
pp. 022419
Author(s):  
David Dustin Fischer ◽  
Martin Knaut ◽  
Johanna Reif ◽  
Frederik Nehm ◽  
Matthias Albert ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Aluminum Nitride ◽  
Atomic Layer ◽  
Water Permeation ◽  
Layer Deposition

Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition

2018 ◽  
Vol 347 ◽  
pp. 181-190 ◽  
Author(s):  
L. Tian ◽  
S. Ponton ◽  
M. Benz ◽  
A. Crisci ◽  
R. Reboud ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Aluminum Nitride ◽  
Hydrogen Plasma ◽  
Atomic Layer ◽  
Layer Deposition
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