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Production of a low‐pressure processing plasma with ion beam injection for thin‐film preparation
Applied Physics Letters
◽
10.1063/1.99588
◽
1988
◽
Vol 52
(23)
◽
pp. 1956-1958
◽
Cited By ~ 2
Author(s):
Hiroharu Fujita
◽
Shinya Yagura
Keyword(s):
Thin Film
◽
Ion Beam
◽
Low Pressure
◽
Beam Injection
◽
Thin Film Preparation
◽
Film Preparation
Download Full-text
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Cited By
References
[bd5078. Thin film preparation by plasma and low pressure CVD in a horizontal reactor
Vacuum
◽
10.1016/0042-207x(82)94111-2
◽
1982
◽
Vol 32
(7)
◽
pp. 443
Keyword(s):
Thin Film
◽
Low Pressure
◽
Horizontal Reactor
◽
Thin Film Preparation
◽
Film Preparation
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Observation of a magnetized low‐pressure rf plasma for thin‐film preparation
Journal of Applied Physics
◽
10.1063/1.347735
◽
1991
◽
Vol 69
(1)
◽
pp. 146-150
◽
Cited By ~ 6
Author(s):
Yoshihiro Okuno
◽
Shinya Yagura
◽
Hiroharu Fujita
Keyword(s):
Thin Film
◽
Low Pressure
◽
Rf Plasma
◽
Thin Film Preparation
◽
Film Preparation
Download Full-text
An Application of a Thin Film Preparation Apparatus with a Broad Ar Ion Beam (Ion Slicer) to Corrosion of a Gold Plated Copper Alloy
Microscopy and Microanalysis
◽
10.1017/s1431927607077215
◽
2007
◽
Vol 13
(S02)
◽
Author(s):
N Endo
◽
H Takahashi
◽
H Nishioka
◽
M Kersker
Keyword(s):
Thin Film
◽
Copper Alloy
◽
Ion Beam
◽
Thin Film Preparation
◽
Film Preparation
Download Full-text
A thin film preparation using focused high power ion beam
International Conference on Plasma Science (papers in summary form only received)
◽
10.1109/plasma.1995.531478
◽
1995
◽
Author(s):
V.M. Bystritskii
◽
S.N. Volkov
◽
A.V. Mytnikov
◽
D. Rej
Keyword(s):
Thin Film
◽
High Power
◽
Ion Beam
◽
Thin Film Preparation
◽
Film Preparation
Download Full-text
Ion-Beam-Induced CVD: An Alternative Method of Thin Film Preparation
Chemical Vapor Deposition
◽
10.1002/cvde.19970030410
◽
1997
◽
Vol 3
(4)
◽
pp. 219-226
◽
Cited By ~ 24
Author(s):
Juan P. Espinós
◽
Asunción Fernádez
◽
Alfonso Caballero
◽
Victor M. Jiménez
◽
Juan C. Sánchez-López
◽
...
Keyword(s):
Thin Film
◽
Ion Beam
◽
Alternative Method
◽
Thin Film Preparation
◽
Film Preparation
Download Full-text
Thin film preparation technology by low energy ion beam deposition.
Shinku
◽
10.3131/jvsj.31.889
◽
1988
◽
Vol 31
(11)
◽
pp. 889-898
Author(s):
Junzo ISHIKAWA
Keyword(s):
Thin Film
◽
Ion Beam
◽
Low Energy
◽
Preparation Technology
◽
Ion Beam Deposition
◽
Thin Film Preparation
◽
Film Preparation
◽
Beam Deposition
Download Full-text
Thin film preparation by plasma and low pressure CVD in a horizontal reactor
Vacuum
◽
10.1016/s0042-207x(81)80502-7
◽
1981
◽
Vol 31
(7)
◽
pp. 309-313
◽
Cited By ~ 5
Author(s):
CE Morosanu
◽
V Soltuz
Keyword(s):
Thin Film
◽
Low Pressure
◽
Horizontal Reactor
◽
Thin Film Preparation
◽
Film Preparation
Download Full-text
A thin film preparation using focused high power ion beam
Digest of Technical Papers. Tenth IEEE International Pulsed Power Conference
◽
10.1109/ppc.1995.599781
◽
2002
◽
Author(s):
V.M. Bystritskii
◽
S.N. Volkov
◽
A.V. Mytnikov
◽
A.A. Sinebryukhov
◽
D.J. Rej
Keyword(s):
Thin Film
◽
High Power
◽
Ion Beam
◽
Thin Film Preparation
◽
Film Preparation
Download Full-text
Low pressure hand made PVD system for high crystalline metal thin film preparation in micro-nanometer scale
10.1063/1.4941492
◽
2016
◽
Author(s):
Ahmad Rosikhin
◽
Aulia Fikri Hidayat
◽
Rinaldo Marimpul
◽
Ibnu Syuhada
◽
Toto Winata
Keyword(s):
Thin Film
◽
Low Pressure
◽
Nanometer Scale
◽
Metal Thin Film
◽
Thin Film Preparation
◽
Film Preparation
◽
Crystalline Metal
Download Full-text
Development of rotational maze-shaped RF magnetron plasma for successful target utilization and thin-film preparation
Japanese Journal of Applied Physics
◽
10.35848/1347-4065/abb758
◽
2020
◽
Vol 60
(SA)
◽
pp. SAAB01
Author(s):
Yasunori Ohtsu
◽
Rei Tanaka
◽
Takahiro Nakashima
Keyword(s):
Thin Film
◽
Thin Film Preparation
◽
Film Preparation
Download Full-text
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