Electron‐spin‐resonance study of defects in plasma‐enhanced chemical vapor deposited silicon nitride

1988 ◽  
Vol 52 (6) ◽  
pp. 445-447 ◽  
Author(s):  
D. Jousse ◽  
J. Kanicki ◽  
D. T. Krick ◽  
P. M. Lenahan
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