Measurement of electrical characteristics and electron density in a fast discharge pumped XeCl excimer laser

1986 ◽  
Vol 48 (24) ◽  
pp. 1639-1641 ◽  
Author(s):  
J. E. Ford ◽  
J. Meyer ◽  
H. Houtman
Keyword(s):  
Electron Density ◽  
Excimer Laser ◽  
Electrical Characteristics ◽  
Fast Discharge ◽  
Xecl Excimer Laser

Poly-Silicon TFT Annealing with XeCl Excimer Laser.

2000 ◽  
Vol 28 (1) ◽  
pp. 24-28 ◽  
Author(s):  
Junichi SHIDA ◽  
Naoyuki KOBAYASHI ◽  
Hideaki KUSAMA
Keyword(s):  
Excimer Laser ◽  
Poly Silicon ◽  
Xecl Excimer Laser

Control of SF6 discharge gap switch by XeCl excimer laser

1991 ◽  
Vol 111 (4) ◽  
pp. 46-51 ◽  
Author(s):  
Hisato Okuda ◽  
Kazuhisa Katayama ◽  
Xiaojun Wang ◽  
Katsumi Masugata ◽  
Kiyoshi Yatsui
Keyword(s):  
Excimer Laser ◽  
Sf6 Discharge ◽  
Discharge Gap ◽  
Xecl Excimer Laser

Phosphorus and Boron Doping of Silicon Thin Films Using ArF Excimer Laser

1991 ◽  
Vol 236 ◽  
Author(s):  
A. Slaoui ◽  
M. Elliq ◽  
H. Pattyn ◽  
E. Fogarassy ◽  
S. De Unamuno ◽  
...  
Keyword(s):  
Sheet Resistance ◽  
Excimer Laser ◽  
Silicon Film ◽  
Boron Doping ◽  
Electrical Characteristics ◽  
Silicon Thin Films ◽  
Shallow Junctions ◽  
Doping Technique ◽  
Arf Excimer Laser ◽  
B Doping

AbstractThis work describes phosphorus (P) and boron (B) doping of polysilicon filns deposited on quartz. Doping is achieved by means of a pulsed ArF excimer laser to melt a controlled thickness of amorphous or polycristalline silicon film coated with a spinon silicate glass (SOG) film containing the dopant (P or B). We have investigated the influence of doping parameters such as laser fluence, number of shots and dopant film thickness on the sheet resistance and the incorporation rate. From these results, we have shown that high doped, shallow junctions presenting sheet resistance lower than 5 kΩ/∠ can be obtained. Poly-Si TFT's with good electrical characteristics were successfully fabricated using this doping technique.

5 kHz high repetition rate and high power XeCl excimer laser

1995 ◽  
Vol 66 (11) ◽  
pp. 5162-5164 ◽  
Author(s):  
Tatsumi Goto ◽  
Koji Kakizaki ◽  
Shigeyuki Takagi ◽  
Noboru Okamoto ◽  
Saburo Sato ◽  
...  
Keyword(s):  
Excimer Laser ◽  
High Power ◽  
Repetition Rate ◽  
High Repetition Rate ◽  
High Repetition ◽  
Xecl Excimer Laser
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