Ion and radical contributions to hydrogenated amorphous silicon film formation in a dc toroidal discharge

1985 ◽  
Vol 46 (11) ◽  
pp. 1048-1050 ◽  
Author(s):  
H. Sugai ◽  
H. Toyoda ◽  
A. Yoshida ◽  
T. Okuda
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