High‐quality single GaAs quantum wells grown by metalorganic chemical vapor deposition

R. C. Miller; R. D. Dupuis; P. M. Petroff

doi:10.1063/1.94814

High‐quality single GaAs quantum wells grown by metalorganic chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.94814 ◽

1984 ◽

Vol 44 (5) ◽

pp. 508-510 ◽

Cited By ~ 33

Author(s):

R. C. Miller ◽

R. D. Dupuis ◽

P. M. Petroff

Keyword(s):

Chemical Vapor Deposition ◽

Quantum Wells ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

High Quality ◽

Metalorganic Chemical

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Growth of high-quality InAlP/InGaP quantum wells and InAlP/InGaP superlattice barrier cladding layers by metalorganic chemical vapor deposition

Journal of Crystal Growth ◽

10.1016/0022-0248(94)91047-2 ◽

1994 ◽

Vol 145 (1-4) ◽

pp. 179-186 ◽

Cited By ~ 8

Author(s):

R.V. Chelakara ◽

M.R. Islam ◽

J.G. Neff ◽

K.G. Fertitta ◽

A.L. Holmes ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Quantum Wells ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

High Quality ◽

Cladding Layers ◽

Metalorganic Chemical

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Photoluminescence in strained GaSb/InGaSb quantum wells by metalorganic chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.351255 ◽

1992 ◽

Vol 71 (3) ◽

pp. 1368-1372 ◽

Cited By ~ 13

Author(s):

Y. K. Su ◽

F. S. Juang ◽

C. H. Su

Keyword(s):

Chemical Vapor Deposition ◽

Quantum Wells ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Metalorganic Chemical

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Improvement in Photoluminescence Efficiency of GaInNAs/GaAs Quantum Wells Grown by Metalorganic Chemical Vapor Deposition for Low-Threshold 1.3 µm Range Lasers

Japanese Journal of Applied Physics ◽

10.1143/jjap.43.5262 ◽

2004 ◽

Vol 43 (8A) ◽

pp. 5262-5268 ◽

Cited By ~ 4

Author(s):

Masao Kawaguchi ◽

Tomoyuki Miyamoto ◽

Fumio Koyama

Keyword(s):

Chemical Vapor Deposition ◽

Quantum Wells ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Low Threshold ◽

Photoluminescence Efficiency ◽

Metalorganic Chemical

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High‐quality GaInAsP/InP heterostructures grown by low‐pressure metalorganic chemical vapor deposition on silicon substrates

Applied Physics Letters ◽

10.1063/1.99521 ◽

1988 ◽

Vol 52 (3) ◽

pp. 209-211 ◽

Cited By ~ 28

Author(s):

M. Razeghi ◽

F. Omnes ◽

M. Defour ◽

Ph. Maurel

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Low Pressure ◽

Silicon Substrates ◽

High Quality ◽

Metalorganic Chemical

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Optical properties of InGaN double heterostructures and quantum wells grown by metalorganic chemical vapor deposition

1997 Digest of the IEEE/LEOS Summer Topical Meeting: Vertical-Cavity Lasers/Technologies for a Global Information Infrastructure/WDM Components Technology/Advanced Semiconductor Lasers and Applications/Gallium Nitride Materials, Processing, and Devices (C ◽

10.1109/leosst.1997.619235 ◽

2002 ◽

Author(s):

R.D. Dupuis ◽

P.A. Grudowski ◽

C.J. Eiting ◽

J. Park ◽

B.S. Shelton ◽

...

Keyword(s):

Optical Properties ◽

Chemical Vapor Deposition ◽

Quantum Wells ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Double Heterostructures ◽

Metalorganic Chemical

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High Quality GaN Layers Grown on SiC Substrates with AlN Buffers by Metalorganic Chemical Vapor Deposition

Chinese Journal of Luminescence ◽

10.3788/fgxb20113209.0896 ◽

2011 ◽

Vol 32 (9) ◽

pp. 896-901 ◽

Cited By ~ 1

Author(s):

陈耀 CHEN Yao ◽

王文新 WANG Wen-xin ◽

黎艳 LI Yan ◽

江洋 JIANG Yang ◽

徐培强 XU Pei-qiang ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

High Quality ◽

Metalorganic Chemical

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Low-pressure metalorganic chemical vapor deposition of high-quality AlN and GaN thin films on sapphire and silicon substrates

10.1117/12.206881 ◽

1995 ◽

Cited By ~ 2

Author(s):

Patrick Kung ◽

Xiaolong Zhang ◽

Erwan Bigan ◽

Manijeh Razeghi ◽

Adam W. Saxler

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Low Pressure ◽

Silicon Substrates ◽

High Quality ◽

Metalorganic Chemical

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High-Quality 1 eV In0.3Ga0.7As on GaAs Substrate by Metalorganic Chemical Vapor Deposition for Inverted Metamorphic Solar Cell Application

Applied Physics Express ◽

10.1143/apex.4.075501 ◽

2011 ◽

Vol 4 (7) ◽

pp. 075501 ◽

Cited By ~ 8

Author(s):

Hong Quan Nguyen ◽

Edward Yi Chang ◽

Hung Wei Yu ◽

Kung Liang Lin ◽

Chen Chen Chung

Keyword(s):

Chemical Vapor Deposition ◽

Solar Cell ◽

Vapor Deposition ◽

Gaas Substrate ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

High Quality ◽

Solar Cell Application ◽

Metalorganic Chemical

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High-Quality AlN Layers Grown on Si(111) Substrates by Metalorganic Chemical Vapor Deposition

Crystallography Reports ◽

10.1134/s1063774520010071 ◽

2020 ◽

Vol 65 (1) ◽

pp. 122-125

Author(s):

I. S. Ezubchenko ◽

M. Ya. Chernykh ◽

I. O. Mayboroda ◽

I. N. Trun’kin ◽

I. A. Chernykh ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

High Quality ◽

Metalorganic Chemical

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Two-step Process for the Metalorganic Chemical Vapor Deposition Growth of High Quality AlN Films on Sapphire

Japanese Journal of Applied Physics ◽

10.1143/jjap.42.1590 ◽

2003 ◽

Vol 42 (Part 1, No. 4A) ◽

pp. 1590-1591 ◽

Cited By ~ 32

Author(s):

Qing Paduano ◽

David Weyburne

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

High Quality ◽

Chemical Vapor Deposition Growth ◽

Step Process ◽

Metalorganic Chemical

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