Effect of rare‐gas diluents on the performance of an XeCl laser pumped by a high‐intensity electron beam

1981 ◽  
Vol 39 (2) ◽  
pp. 145-147 ◽  
Author(s):  
Gary C. Tisone ◽  
James M. Hoffman
Keyword(s):  
Electron Beam ◽  
High Intensity ◽  
Rare Gas ◽  
Xecl Laser

Theoretical evaluation of the rare‐gas diluent effects for an electron‐beam‐excited XeCl laser

1983 ◽  
Vol 42 (9) ◽  
pp. 766-768 ◽  
Author(s):  
Fumihiko Kannari ◽  
Akira Suda ◽  
Minoru Obara ◽  
Tomoo Fujioka
Keyword(s):  
Electron Beam ◽  
Rare Gas ◽  
Xecl Laser ◽  
Theoretical Evaluation

A New High Intensity Grid Cap for RCA-EMU-3 Electron Microscopes

1968 ◽  
Vol 26 ◽  
pp. 316-317
Author(s):  
George Christov ◽  
Bolivar J. Lloyd
Keyword(s):  
Electron Beam ◽  
Electron Microscope ◽  
High Voltage ◽  
High Intensity ◽  
Electron Gun ◽  
Tungsten Filament ◽  
Fluorescent Screen ◽  
Electron Microscopes ◽  
Pass Through ◽  
Ground Potential

A new high intensity grid cap has been designed for the RCA-EMU-3 electron microscope. Various parameters of the new grid cap were investigated to determine its characteristics. The increase in illumination produced provides ease of focusing on the fluorescent screen at magnifications from 1500 to 50,000 times using an accelerating voltage of 50 KV.The EMU-3 type electron gun assembly consists of a V-shaped tungsten filament for a cathode with a thin metal threaded cathode shield and an anode with a central aperture to permit the beam to course the length of the column. The cathode shield is negatively biased at a potential of several hundred volts with respect to the filament. The electron beam is formed by electrons emitted from the tip of the filament which pass through an aperture of 0.1 inch diameter in the cap and then it is accelerated by the negative high voltage through a 0.625 inch diameter aperture in the anode which is at ground potential.

An Injection Method of a High Intensity Relativistic Electron Beam into a Toroidal Device

1975 ◽  
Vol 14 (9) ◽  
pp. 1413-1414
Author(s):  
Masaru Masuzaki ◽  
Akihiro Mohri ◽  
Tetsuya Tsuzuki ◽  
Kazunari Ikuta
Keyword(s):  
Electron Beam ◽  
Relativistic Electron ◽  
High Intensity ◽  
Relativistic Electron Beam ◽  
Injection Method

OFI rare-gas excimer amplifier for high-intensity VUV pulse generation

2009 ◽  
Author(s):  
Masahito Katto ◽  
Masanori Kaku ◽  
Kazuyoshi Oda ◽  
Tadashi Kamikihara ◽  
Atsushi Yokotani ◽  
...  
Keyword(s):  
High Intensity ◽  
Pulse Generation ◽  
Rare Gas

Structure of the surface layer of a wear-resistant coating after treatment with a high-intensity electron beam

2015 ◽  
Vol 9 (5) ◽  
pp. 934-938 ◽  
Author(s):  
S. V. Raykov ◽  
E. V. Kapralov ◽  
E. S. Vashchuk ◽  
E. A. Budovskikh ◽  
V. E. Gromov ◽  
...  
Keyword(s):  
Surface Layer ◽  
Electron Beam ◽  
High Intensity ◽  
Wear Resistant Coating ◽  
Wear Resistant ◽  
Resistant Coating

scholarly journals The Effect of High-Intensity Electron Beam on the Crystal Structure, Phase Composition, and Properties of Al–Si Alloys with Different Silicon Content

2021 ◽  
Vol 22 (1) ◽  
pp. 129-157
Author(s):  
D. V. Zaguliaev ◽  
S. V. Konovalov ◽  
Yu. F. Ivanov ◽  
V. E. Gromov ◽  
V. V. Shlyarov ◽  
...  
Keyword(s):  
Solid Solution ◽  
Electron Beam ◽  
Phase Composition ◽  
Crystal Lattice ◽  
High Intensity ◽  
Materials Science ◽  
Lattice Parameter ◽  
Crystal Lattice Parameter ◽  
Material Surface ◽  
Modified Layer

The study deals with the element–phase composition, microstructure evolution, crystal-lattice parameter, and microdistortions as well as the size of the coherent scattering region in the Al–10.65Si–2.11Cu and Al–5.39Si–1.33Cu alloys irradiated with the high-intensity electron beam. As revealed by the methods of x-ray phase analysis, the principal phases in untreated alloys are the aluminium-based solid solution, silicon, intermetallics, and Fe2Al9Si2 phase. In addition, the Cu9Al4 phase is detected in Al–10.65Si–2.11Cu alloy. Processing alloys with the pulsed electron beam induces the transformation of lattice parameters of Al–10.65Si–2.11Cu (aluminium-based solid solution) and Al–5.39Si–1.33Cu (Al1 and Al2 phases). The reason for the crystal-lattice parameter change in the Al–10.65Si–2.11Cu and Al–5.39Si–1.33Cu alloys is suggested to be the changing concentration of alloying elements in the solid solution of these phases. As established, if a density of electron beam is of 30 and 50 J/cm2, the silicon and intermetallic compounds dissolve in the modified layer. The state-of-the-art methods of the physical materials science made possible to establish the formation of a layer with a nanocrystalline structure of the cell-type crystallization because of the material surface irradiation. The thickness of a modified layer depends on the parameters of the electron-beam treatment and reaches maximum of 90 µm at the energy density of 50 J/cm2. According to the transmission (TEM) and scanning (SEM) electron microscopy data, the silicon particles occupy the cell boundaries. Such changes in the structural and phase states of the materials response on their mechanical characteristics. To characterize the surface properties, the microhardness, wear parameter, and friction coefficient values are determined directly on the irradiated surface for all modification variants. As shown, the irradiation of the material surface with an intensive electron beam increases wear resistance and microhardness of the Al–10.65Si–2.11Cu and Al–5.39Si–1.33Cu alloys.

Investigation of the emission characteristics of an XeCl laser excited by microsecond electron-beam pulses

1987 ◽  
Vol 17 (5) ◽  
pp. 605-607
Author(s):  
Yu I Bychkov ◽  
N G Ivanov ◽  
V F Losev ◽  
Gennadii A Mesyats ◽  
V V Ryzhov
Keyword(s):  
Electron Beam ◽  
Emission Characteristics ◽  
Xecl Laser
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