High‐efficiency multiply pulsed copper vapor laser utilizing copper chloride as a lasant

1975 ◽  
Vol 26 (9) ◽  
pp. 504-505 ◽  
Author(s):  
Che J. Chen ◽  
Gary R. Russell
Keyword(s):  
High Efficiency ◽  
Copper Chloride ◽  
Copper Vapor Laser ◽  
Vapor Laser ◽  
Copper Vapor

Double‐discharge copper vapor laser with copper chloride as a lasant

1973 ◽  
Vol 23 (9) ◽  
pp. 514-515 ◽  
Author(s):  
C. J. Chen ◽  
N. M. Nerheim ◽  
G. R. Russell
Keyword(s):  
Copper Chloride ◽  
Copper Vapor Laser ◽  
Vapor Laser ◽  
Copper Vapor ◽  
Double Discharge

High efficiency diffraction limited operation of a copper vapor laser

1991 ◽  
Vol 81 (1-2) ◽  
pp. 138-144 ◽  
Author(s):  
R. Pini ◽  
R. Salimbeni ◽  
G. Toci ◽  
M. Vannini
Keyword(s):  
High Efficiency ◽  
Copper Vapor Laser ◽  
Vapor Laser ◽  
Limited Operation ◽  
Copper Vapor

Fast etching and metallization of via-holes in sapphire with the help of radiation by a copper vapor laser

1997 ◽  
Vol 109-110 ◽  
pp. 201-205 ◽  
Author(s):  
S.I. Dolgaev ◽  
A.A. Lyalin ◽  
A.V. Simakin ◽  
V.V. Voronov ◽  
G.A. Shafeev
Keyword(s):  
Copper Vapor Laser ◽  
Vapor Laser ◽  
Copper Vapor ◽  
Via Holes

Repetitively pulsed discharge plasma-controlled copper-vapor laser kinetics

2000 ◽  
Author(s):  
Anatoly N. Soldatov ◽  
Andrey V. Lugovskoy ◽  
Yu. P. Polunin ◽  
A. A. Fofanov ◽  
L. N. Chausova
Keyword(s):  
Discharge Plasma ◽  
Copper Vapor Laser ◽  
Pulsed Discharge ◽  
Vapor Laser ◽  
Copper Vapor ◽  
Pulsed Discharge Plasma
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