Suppression of secondary electron emission from the material surfaces with grazing incident magnetic field in the plasma

1996 ◽  
Vol 3 (12) ◽  
pp. 4310-4312 ◽  
Author(s):  
S. Takamura ◽  
S. Mizoshita ◽  
N. Ohno
Keyword(s):  
Magnetic Field ◽  
Electron Emission ◽  
Secondary Electron ◽  
Secondary Electron Emission ◽  
Material Surfaces

scholarly journals Magnetic field effects on secondary electron emission during ion implantation in a nitrogen plasma

2006 ◽  
Vol 100 (3) ◽  
pp. 033303 ◽  
Author(s):  
Ing Hwie Tan ◽  
Mario Ueda ◽  
Renato S. Dallaqua ◽  
Rogerio de Moraes Oliveira ◽  
José O. Rossi
Keyword(s):  
Magnetic Field ◽  
Ion Implantation ◽  
Electron Emission ◽  
Secondary Electron ◽  
Secondary Electron Emission ◽  
Nitrogen Plasma ◽  
Magnetic Field Effects ◽  
Field Effects

scholarly journals Secondary electron emission under magnetic constraint: from Monte Carlo simulations to analytical solution

2021 ◽  
Vol 11 (1) ◽  
Author(s):  
Claudiu Costin
Keyword(s):  
Magnetic Field ◽  
Monte Carlo ◽  
Analytical Solution ◽  
Monte Carlo Simulations ◽  
Electron Emission ◽  
Secondary Electron ◽  
Secondary Electron Emission ◽  
Emission Process ◽  
Wide Range ◽  
The Magnetic Field

AbstractThe secondary electron emission process is essential for the optimal operation of a wide range of applications, including fusion reactors, high-energy accelerators, or spacecraft. The process can be influenced and controlled by the use of a magnetic field. An analytical solution is proposed to describe the secondary electron emission process in an oblique magnetic field. It was derived from Monte Carlo simulations. The analytical formula captures the influence of the magnetic field magnitude and tilt, electron emission energy, electron reflection on the surface, and electric field intensity on the secondary emission process. The last two parameters increase the effective emission while the others act the opposite. The electric field effect is equivalent to a reduction of the magnetic field tilt. A very good agreement is shown between the analytical and numerical results for a wide range of parameters. The analytical solution is a convenient tool for the theoretical study and design of magnetically assisted applications, providing realistic input for subsequent simulations.

Suppression of secondary electron emission in a magnetic field

1984 ◽  
Vol 27 (12) ◽  
pp. 1017-1021
Author(s):  
V. I. Volosov ◽  
I. N. Meshkov ◽  
A. V. Shemyakin
Keyword(s):  
Magnetic Field ◽  
Electron Emission ◽  
Secondary Electron ◽  
Secondary Electron Emission

scholarly journals The System for Control and Stabilization of the Beam Position in the Microtron MT-25 in Prague

10.14311/520 ◽  
2004 ◽  
Vol 44 (1) ◽  
Author(s):  
Č. Šimáně ◽  
M. Vognar ◽  
D. Chvátil
Keyword(s):  
Magnetic Field ◽  
Electron Emission ◽  
Secondary Electron ◽  
Beam Quality ◽  
Secondary Electron Emission ◽  
Remote Measurement ◽  
Output Window ◽  
Beam Position ◽  
Wire Probe ◽  
The Wire

A method of control the beam position at crucial points of the transport system and for the stabilization of its output position has been proposed and preliminary tested. The method is based on secondary electron emission from a thin metallic wire probe induced by electrons from the 25 MeV microtron. It was demonstrated, that magnetic field of the order of 0.2 T and parallel to the wire probe in front of the orifice of the extraction channel in the acceleration space, does not prevent the functioning of the method. A strong parasitic effect of secondary electron emission from the material of the channel and its support construction was found, leading to the inversion of the electron current polarity from the wire. This effect can be to great extent eliminated by negative electric potential bias relative to the channel. At the electron output current of 1 mA the secondary emission current from the wire probe of 0.3 mm diameter is of the order of several nA. Two electromechanical systems were designed for the removal of the probes from the beam path, to avoid the deterioration of the electron beam quality by scattering. Electronic schemes used for remote measurement of small probe currents, suppressing the influence of strong electromagnetic noise, are described. For stabilization of the output beam position two wire probes situated in air close to the Al output window were used. These probes having been placed at the periphery of the beam did not deteriorate the beam quality. The difference of their emission currents was used as an error signal to control the magnetic field of the last dipole, which kept the beam in the center of the output window. 

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