Parametric instabilities and ion heating in a two ion-species plasma

1979 ◽  
Vol 22 (12) ◽  
pp. 2331 ◽  
Author(s):  
C. C. Lin ◽  
A. T. Lin ◽  
H. Okuda
2004 ◽  
Vol 30 (4) ◽  
pp. 307-317
Author(s):  
I. V. Kuzora ◽  
V. P. Silin ◽  
S. A. Uryupin
Keyword(s):  

1979 ◽  
Vol 40 (C7) ◽  
pp. C7-649-C7-650
Author(s):  
S. M. Musher ◽  
B. D. Ochirov ◽  
A. M. Rubenchik

2014 ◽  
Vol 134 (9) ◽  
pp. 523-524
Author(s):  
Hideya Koike ◽  
Masanobu Annoura ◽  
Kento Nishida ◽  
Hiroshi Tanabe ◽  
Michiaki Inomoto ◽  
...  

2002 ◽  
Vol 716 ◽  
Author(s):  
Alok Nandini ◽  
U. Roy ◽  
A. Mallikarjunan ◽  
A. Kumar ◽  
J. Fortin ◽  
...  

AbstractThin films of low dielectric constant (κ) materials such as Xerogel (ĸ=1.76) and SilkTM (ĸ=2.65) were implanted with argon, neon, nitrogen, carbon and helium with 2 x 1015 cm -2 and 1 x 1016 cm -2 dose at energies varying from 50 to 150 keV at room temperature. In this work we discuss the improvement of hardness as well as elasticity of low ĸ dielectric materials by ion implantation. Ultrasonic Force Microscopy (UFM) [6] and Nano indentation technique [5] have been used for qualitative and quantitative measurements respectively. The hardness increased with increasing ion energy and dose of implantation. For a given energy and dose, the hardness improvement varied with ion species. Dramatic improvement of hardness is seen for multi-dose implantation. Among all the implanted ion species (Helium, Carbon, Nitrogen, Neon and Argon), Argon implantation resulted in 5x hardness increase in Xerogel films, sacrificing only a slight increase (∼ 15%) in dielectric constant.


2020 ◽  
Vol 255 ◽  
pp. 107249 ◽  
Author(s):  
Shinsuke Satake ◽  
Motoki Nataka ◽  
Theerasarn Pianpanit ◽  
Hideo Sugama ◽  
Masanori Nunami ◽  
...  

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