Novel metrology for the DUV photolithography sequence

The 1998 international conference on characterization and metrology for ULSI technology ◽

10.1063/1.56842 ◽

1998 ◽

Author(s):

Nickhil Jakatdar ◽

Xinhui Niu ◽

Haolin Zhang ◽

Junwei Bao ◽

Costas Spanos

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