Remotely induced high-density hollow-anode plasma and its application to fast deposition of photosensitive microcrystalline silicon thin film with preferential orientation
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1998 ◽
Vol 37
(Part 2, No. 9A/B)
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pp. L1078-L1081
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2008 ◽
Vol 52
(3)
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pp. 432-435
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