Materials processing using radio-frequency ion-sources: Ion-beam sputter-deposition and surface treatment

2019 ◽  
Vol 90 (2) ◽  
pp. 023901 ◽  
Author(s):  
M. Becker ◽  
M. Gies ◽  
A. Polity ◽  
S. Chatterjee ◽  
P. J. Klar
Keyword(s):  
Radio Frequency ◽  
Surface Treatment ◽  
Ion Beam ◽  
Sputter Deposition ◽  
Ion Sources ◽  
Materials Processing ◽  
Ion Beam Sputter Deposition

Recent advances in Veeco’s radio frequency ion sources for ion beam materials processing applications (abstract)

2002 ◽  
Vol 73 (2) ◽  
pp. 880-880
Author(s):  
A. V. Hayes ◽  
V. Kanarov ◽  
R. Yevtukhov ◽  
K. Williams ◽  
D. Hines ◽  
...  
Keyword(s):  
Radio Frequency ◽  
Ion Beam ◽  
Ion Sources ◽  
Materials Processing ◽  
Recent Advances

scholarly journals Stable Cu2O Photoelectrodes by Reactive Ion Beam Sputter Deposition

2018 ◽  
Vol 2018 ◽  
pp. 1-7
Author(s):  
Ching-Hsiu Chen ◽  
Assamen Ayalew Ejigu ◽  
Liang-Chiun Chao
Keyword(s):  
Electrode Materials ◽  
Variable Temperature ◽  
Ion Beam ◽  
Sputter Deposition ◽  
Flow Rates ◽  
Vacancy Defects ◽  
Photoluminescence Study ◽  
P Type ◽  
Quartz Substrates ◽  
Ion Beam Sputter Deposition

Cu2O has been deposited on quartz substrates by reactive ion beam sputter deposition. Experimental results show that by controlling argon/oxygen flow rates, both n-type and p-type Cu2O samples can be achieved. The bandgap of n-type and p-type Cu2O were found to be 2.3 and 2.5 eV, respectively. The variable temperature photoluminescence study shows that the n-type conductivity is due to the presence of oxygen vacancy defects. Both samples show stable photocurrent response that photocurrent change of both samples after 1,000 seconds of operation is less than 5%. Carrier densities were found to be 1.90 × 1018 and 2.24 × 1016 cm−3 for n-type and p-type Cu2O, respectively. Fermi energies have been calculated, and simplified band structures are constructed. Our results show that Cu2O is a plausible candidate for both photoanodic and photocathodic electrode materials in photoelectrochemical application.

Ion beam sputter deposition of low-defect EUV mask blanks on 6-in. LTEM substrates in a real production environment

2002 ◽  
Author(s):  
Hans W. Becker ◽  
Lutz Aschke ◽  
Birgit Schubert ◽  
Juergen Krieger ◽  
Frank Lenzen ◽  
...  
Keyword(s):  
Ion Beam ◽  
Sputter Deposition ◽  
Production Environment ◽  
Ion Beam Sputter Deposition

Ion beam sputter deposition onto levitated and stalk mounted laser fusion targets

1982 ◽  
Vol 20 (4) ◽  
pp. 1331-1335 ◽  
Author(s):  
D. A. Glocker ◽  
J. P. Drumheller ◽  
J. R. Miller
Keyword(s):  
Ion Beam ◽  
Sputter Deposition ◽  
Laser Fusion ◽  
Ion Beam Sputter Deposition
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