scholarly journals Low temperature preparation of HfO2/SiO2stack structure for interface dipole modulation

2018 ◽  
Vol 113 (25) ◽  
pp. 251601 ◽  
Author(s):  
Noriyuki Miyata
2004 ◽  
Vol 173 (1-4) ◽  
pp. 113-118 ◽  
Author(s):  
C DELACOURT ◽  
C WURM ◽  
P REALE ◽  
M MORCRETTE ◽  
C MASQUELIER

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