scholarly journals Electron-selective atomic-layer-deposited TiOx layers: Impact of post-deposition annealing and implementation into n-type silicon solar cells

2018 ◽  
Author(s):  
Valeriya Titova ◽  
Dimitrij Startsev ◽  
Jan Schmidt
2014 ◽  
Vol 550 ◽  
pp. 541-544 ◽  
Author(s):  
Benjamin G. Lee ◽  
Shuo Li ◽  
Guillaume von Gastrow ◽  
Marko Yli-Koski ◽  
Hele Savin ◽  
...  

Materials ◽  
2021 ◽  
Vol 14 (12) ◽  
pp. 3328
Author(s):  
Atish Bhattacharjee ◽  
Tae-Woo Kim

In this study, an investigation was performed on the properties of atomic-layer-deposited aluminum oxide (Al2O3) on an n-type silicon (n-Si) substrate based on the effect of post-deposition heat treatment, which was speckled according to ambient temperature and treatment applied time. Based on these dealings, a series of distinctions for extracted capacitance and dielectric constant, hysteresis was performed on annealed and nonannealed samples. The interface and border trap responses, including stress behavior after an application of constant voltage for a specific time and surface morphology by X-ray diffraction (XRD) technique, were also analyzed between the two above-mentioned sample types. Based on observation, the annealed samples showed superior performance in every aspect compared with the nonannealed ones. Some unusual behaviors after high annealing temperature were found, and the explanation is the ion diffusion from oxide layer towards the semiconductor. Since a constant voltage stress was not widely used on the metal–oxide–semiconductor capacitor (MOSCAP), this analysis was determined to reveal a new dimension of post-deposition annealing condition for the Al/Al2O3/n-Si gate stack.


2009 ◽  
Vol 1210 ◽  
Author(s):  
Michael Stavola ◽  
Fan Jiang ◽  
Suppawan Kleekajai ◽  
Lanlin Wen ◽  
Chao Peng ◽  
...  

AbstractHydrogen is commonly introduced into silicon solar cells to reduce the deleterious effects of defects and to increase cell efficiency. We have developed strategies by which hydrogen in silicon can be detected by IR spectroscopy with high sensitivity. The introduction of hydrogen into Si by the post-deposition annealing of a hydrogen-rich, SiNx coating has been investigated to determine hydrogen's concentration and penetration depth. Different hydrogenation processes were studied so that their effectiveness for the passivation of bulk defects could be compared. The best conditions investigated in our experiments yielded a hydrogen concentration near 1015 cm-3 and a diffusion depth consistent with the diffusivity of H found by Van Wieringen and Warmoltz.


2011 ◽  
Vol 8 ◽  
pp. 487-492 ◽  
Author(s):  
F. Book ◽  
T. Wiedenmann ◽  
G. Schubert ◽  
H. Plagwitz ◽  
G. Hahn

2011 ◽  
Vol 8 ◽  
pp. 571-576 ◽  
Author(s):  
A. Kalio ◽  
A. Richter ◽  
M. Hörteis ◽  
S.W. Glunz

2014 ◽  
Vol 131 ◽  
pp. 105-109 ◽  
Author(s):  
Friedemann D. Heinz ◽  
Matthias Breitwieser ◽  
Paul Gundel ◽  
Markus König ◽  
Matthias Hörteis ◽  
...  

2016 ◽  
Vol 6 (2) ◽  
pp. 419-425 ◽  
Author(s):  
Bernd Steinhauser ◽  
Mathias Kamp ◽  
Andreas A. Brand ◽  
Ulrich Jager ◽  
Jonas Bartsch ◽  
...  

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