Comparison of atomic layer deposited Al2O3 and (Ta2O5)0.12(Al2O3)0.88 gate dielectrics on the characteristics of GaN-capped AlGaN/GaN metal-oxide-semiconductor high electron mobility transistors
2017 ◽
Vol 33
(1)
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pp. 015007
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2019 ◽
pp. 391-402
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2020 ◽
Vol 67
(5)
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pp. 1939-1945
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2013 ◽
Vol 52
(8S)
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pp. 08JN08
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2019 ◽
Vol 58
(SC)
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pp. SCCD21
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