scholarly journals Modeling tunnel field effect transistors—From interface chemistry to non-idealities to circuit level performance

2018 ◽  
Vol 124 (15) ◽  
pp. 154503 ◽  
Author(s):  
Sheikh Z. Ahmed ◽  
Yaohua Tan ◽  
Daniel S. Truesdell ◽  
Benton H. Calhoun ◽  
Avik W. Ghosh
1995 ◽  
Vol 405 ◽  
Author(s):  
G. Lucovsky ◽  
D. R. Lee ◽  
Z. Jing ◽  
J. L. Whitten ◽  
C. Parker ◽  
...  

AbstractIncorporation of N-atoms at the Si-Si02 interface in field effect transistors, FETs, with ultrathin dielectrics (≤ 5.5 nm) improves device reliability. Four aspects of our recent research on nitrided Si-Si02 interfaces are discussed in this paper: i) the low-temperature/low-thermal budget process by which interface chemistry is controlled, and optimized; ii) the use of on-line and off-line diagnostics to determine the spatial confinement and concentration of interfacial N-atom incorporation; iii) comparisons of device properties for non-nitrided and nitrided interfaces; and iv) the proposal of an atom-scale model for the role that interfacial N-atoms play in improving device reliability.


2018 ◽  
Vol 2 (1) ◽  
pp. 75-88 ◽  
Author(s):  
Christopher M. Smyth ◽  
Lee A. Walsh ◽  
Pavel Bolshakov ◽  
Massimo Catalano ◽  
Rafik Addou ◽  
...  

2008 ◽  
Author(s):  
Takafumi Uemura ◽  
Masakazu Yamagishi ◽  
Yukihiro Tominari ◽  
Jun Takeya

2008 ◽  
Author(s):  
M. Uno ◽  
I. Doi ◽  
K. Takimiya ◽  
Jun Takeya

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