Low temperature plasmas induced in SF6 by extreme ultraviolet (EUV) pulses

2018 ◽  
Vol 25 (6) ◽  
pp. 063508 ◽  
Author(s):  
A. Bartnik ◽  
W. Skrzeczanowski ◽  
J. Czwartos ◽  
J. Kostecki ◽  
H. Fiedorowicz ◽  
...  
Keyword(s):  
Low Temperature ◽  
Extreme Ultraviolet ◽  
Low Temperature Plasmas

scholarly journals Temporal measurements of extreme ultraviolet (EUV) emission, from low temperature, EUV-induced plasmas

2018 ◽  
Vol 36 (3) ◽  
pp. 286-292 ◽  
Author(s):  
A. Bartnik ◽  
H. Fiedorowicz ◽  
P. Wachulak ◽  
T. Fok
Keyword(s):  
Low Temperature ◽  
Extreme Ultraviolet ◽  
Detection System ◽  
Grazing Incidence ◽  
Euv Emission ◽  
Multiply Charged ◽  
Low Temperature Plasmas ◽  
Charged Ions ◽  
Different Gases ◽  
Selection Of

AbstractIn this work, extreme ultraviolet (EUV) emission, from EUV induced, low-temperature microplasmas, were investigated. To perform temporal measurements of the EUV pulses of low intensity, in a medium vacuum, under the pressure of the order of 0.1–0.01 mbar a special detection system was prepared. The system was based on an EUV collector and a semiconductor detector, sensitive for the EUV photons. The collector consisted of two identical grazing incidence, paraboloidal mirrors, and allowed to focus a part of the radiation emitted from the microplasma onto the detector surface. An absorption filter, mounted between the collector and the detector, allowed for selection of an interesting wavelength range. Plasmas were created by irradiation of small portions of gases, injected into the vacuum chamber, using a laser produced plasma EUV source. Three gases were used for the EUV induced plasma formation: neon, krypton, and xenon. Low-temperature plasmas, created in these gases, contained multiply charged ions, emitting radiation in similar wavelength ranges. Two detectors, AXUV20HS1 and AXUVHS5, were used for the measurements. It was shown that differences between the corresponding signal profiles, obtained using both detectors, were not very significant. Moreover, it was demonstrated that the duration of the EUV emission from plasmas, created in different gases, were comparable with the duration of the driving EUV pulse. The longest EUV emission was observed for Kr plasmas, approximately 1.5 times the full width half maximum of the driving EUV pulse.

scholarly journals Time-resolved measurements of extreme ultraviolet (EUV) emission, from EUV-induced He, Ne, and Ar plasmas

2019 ◽  
Vol 37 (01) ◽  
pp. 49-54 ◽  
Author(s):  
A. Bartnik ◽  
H. Fiedorowicz ◽  
P. Wachulak ◽  
T. Fok
Keyword(s):  
Low Temperature ◽  
Extreme Ultraviolet ◽  
Detection System ◽  
Time Duration ◽  
Time Resolved ◽  
Time Profiles ◽  
Euv Emission ◽  
Order Of Magnitude ◽  
Low Temperature Plasmas ◽  
Time Resolved Measurements

AbstractIrradiation of gases with intense pulses of extreme ultraviolet (EUV) can result in the formation of low-temperature plasmas. During the time of irradiation, various non-thermal processes driven by the EUV photons and photoelectrons take place, leading to the creation of excited states of atoms and ions. Fast relaxation of these states should result in EUV emission within a time comparable to the driving EUV pulse. On the other hand, from our earlier works, a time duration of the emission in an optical range is over an order of magnitude longer. It can be thus expected that the time of EUV emission can be also relatively long. In this work, time-resolved measurements of the EUV emission from low-temperature plasmas induced in He, Ne, and Ar gases were performed. Due to a low intensity of the emitted radiation, a specially prepared detection system, based on an EUV collector and an EUV sensitive photodiode, was employed. In all cases, a time duration of the EUV emission was much longer compared with the driving EUV pulse. Time profiles of the corresponding signals were specific for particular gases. In case of He and Ne plasmas, these time profiles varied with initial densities of gases to be ionized. The corresponding dependence was especially visible in case of plasmas induced in helium. In case of Ar plasmas, such dependence was not revealed.

scholarly journals Low-temperature plasmas induced in nitrogen by extreme ultraviolet (EUV) pulses

2018 ◽  
Vol 36 (1) ◽  
pp. 76-83 ◽  
Author(s):  
A. Bartnik ◽  
W. Skrzeczanowski ◽  
H. Fiedorowicz ◽  
P. Wachulak ◽  
T. Fok
Keyword(s):  
Low Temperature ◽  
Extreme Ultraviolet ◽  
High Energy ◽  
Molecular Ions ◽  
Molecular Spectra ◽  
Essential Difference ◽  
Time Resolved ◽  
Wide Wavelength Range ◽  
Low Temperature Plasmas ◽  
Spectral Ranges

AbstractIn this work, a comparative study of low-temperature plasmas, induced in a gaseous nitrogen by photoionization of the gas using two different irradiation systems, was performed. Both systems were based on laser-produced Xe plasmas, emitting intense extreme ultraviolet (EUV) radiation pulses in a wide wavelength range. The essential difference between the systems concerned formation of the EUV beam. The first one utilized a dedicated ellipsoidal mirror for collecting and focusing of the EUV radiation. This way a high radiation fluence could be obtained for ionization of the N2 gas injected into the vacuum chamber. The second system did not contain any EUV collector. In this case, the nitrogen to be ionized was injected into the vicinity of the Xe plasma. In both cases, energies of emitted photons were sufficient for dissociative ionization, ionization of atoms or even ions. The resulting photoelectrons had also sufficiently high energy for further ionizations or excitations. Low-temperature plasmas, created this way, were investigated by spectral measurements in the EUV, ultraviolet (UV) and visible (VIS) spectral ranges. Time-resolved UV/VIS spectra, corresponding to single-charged ions, molecules, and molecular ions, were recorded. Numerical simulations of the molecular spectra were performed allowing one to estimate vibrational and rotational temperatures of plasmas created using both irradiation systems.

Low-temperature plasmas with nonequilibrium ionization

1979 ◽  
Vol 128 (6) ◽  
pp. 233 ◽  
Author(s):  
L.M. Biberman ◽  
V.S. Vorob'ev ◽  
I.T. Yakubov
Keyword(s):  
Low Temperature ◽  
Nonequilibrium Ionization ◽  
Low Temperature Plasmas

Nanosecond Pulse Burst Ignition of Ethylene and Acetylene by Uniform Low-Temperature Plasmas

2008 ◽  
Author(s):  
Evgeny Mintusov ◽  
Inchul Choi ◽  
Walter Lempert ◽  
Igor Adamovich ◽  
M. Nishihara ◽  
...  
Keyword(s):  
Low Temperature ◽  
Nanosecond Pulse ◽  
Pulse Burst ◽  
Low Temperature Plasmas
Sign in / Sign up

Export Citation Format

Share Document